Molecular-beam epitaxial growth and surface diffusion

We investigate the statistical properties of the surface of thin films grown by molecular-beam epitaxy (MBE). We present and analyze a simple model of MBE growth which incorporates surface diffusion and deposition in a physically correct manner. The short-time behavior does not correspond to that pr...

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Veröffentlicht in:Physical review letters 1992-07, Vol.69 (1), p.100-103
Hauptverfasser: KESSLER, D. A, LEVINE, H, SANDER, L. M
Format: Artikel
Sprache:eng
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Zusammenfassung:We investigate the statistical properties of the surface of thin films grown by molecular-beam epitaxy (MBE). We present and analyze a simple model of MBE growth which incorporates surface diffusion and deposition in a physically correct manner. The short-time behavior does not correspond to that predicted by the continuum model of Villain, Das Sarma, and others. At long times, the model is governed by Kardar-Parisi-Zhang dynamics.
ISSN:0031-9007
1079-7114
DOI:10.1103/PhysRevLett.69.100