PRINCIPAL COMPONENT ANALYSIS OF OPTICAL-EMISSION SPECTROSCOPY AND MASS-SPECTROMETRY - APPLICATION TO REACTIVE ION ETCH PROCESS PARAMETER-ESTIMATION USING NEURAL NETWORKS

We report on a simple technique that characterizes the effect of process parameters (i.e., pressure, RF power, and gas mixture) on the optical emission and mass spectra of CHF3/O2 plasma. This technique is sensitive to changes in chamber contamination levels (e.g., formation of Teflon-like thin-film...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of the Electrochemical Society 1992-03, Vol.139 (3), p.907-914
Hauptverfasser:	SHADMEHR, R, ANGELL, D, CHOU, PB, OEHRLEIN, GS, JAFFE, RS
Format:	Artikel
Sprache:	eng
Schlagworte:	Electrochemistry Exact sciences and technology Materials Science Materials Science, Coatings & Films Physical Sciences Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma devices Science & Technology Technology
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!