Contrast Analysis of Polarization in Three-Beam Interference Lithography
This paper analyzes the effect of polarization and the incident angle on the contrasts of interference patterns in three-beam interference lithography. A non-coplanar laser interference system was set up to simulate the relationship between contrast, beam polarization, and the incident angle. Differ...
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| Veröffentlicht in: | Applied sciences 2021-06, Vol.11 (11), p.4789, Article 4789 |
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| creator | Peng, Fuping Du, Jing Du, Jialin Wang, Simo Yan, Wei |
| description | This paper analyzes the effect of polarization and the incident angle on the contrasts of interference patterns in three-beam interference lithography. A non-coplanar laser interference system was set up to simulate the relationship between contrast, beam polarization, and the incident angle. Different pattern periods require different incident angles, which means different contrast losses in interference lithography. Two different polarization modes were presented to study the effects of polarization with different incident angles based on theoretical analysis simulations. In the case of the co-directional component TE polarization mode, it was demonstrated that the pattern contrast decreases with the increase in the incident angle and the contrast loss caused by the polarization angle error also grew rapidly. By changing the mode to azimuthal (TE-TE-TE) polarization, the contrast of the interference pattern can be ensured to remain above 0.97 even though the incident angle is large. In addition, TE-TE-TE mode can accept larger polarization angle errors. This conclusion provides a theoretical basis for the generation of high-contrast light fields at different incident angles, and the conclusion is also applicable to multi-beam interference lithography. |
| doi_str_mv | 10.3390/app11114789 |
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A non-coplanar laser interference system was set up to simulate the relationship between contrast, beam polarization, and the incident angle. Different pattern periods require different incident angles, which means different contrast losses in interference lithography. Two different polarization modes were presented to study the effects of polarization with different incident angles based on theoretical analysis simulations. In the case of the co-directional component TE polarization mode, it was demonstrated that the pattern contrast decreases with the increase in the incident angle and the contrast loss caused by the polarization angle error also grew rapidly. By changing the mode to azimuthal (TE-TE-TE) polarization, the contrast of the interference pattern can be ensured to remain above 0.97 even though the incident angle is large. In addition, TE-TE-TE mode can accept larger polarization angle errors. This conclusion provides a theoretical basis for the generation of high-contrast light fields at different incident angles, and the conclusion is also applicable to multi-beam interference lithography.</description><identifier>ISSN: 2076-3417</identifier><identifier>EISSN: 2076-3417</identifier><identifier>DOI: 10.3390/app11114789</identifier><language>eng</language><publisher>BASEL: Mdpi</publisher><subject>Beams (radiation) ; Chemistry ; Chemistry, Multidisciplinary ; Electric fields ; Engineering ; Engineering, Multidisciplinary ; incident angle ; interference lithography ; Lasers ; Light ; Lithography ; Materials Science ; Materials Science, Multidisciplinary ; pattern contrast ; Physical Sciences ; Physics ; Physics, Applied ; Polarization ; Science & Technology ; Technology ; Theoretical analysis</subject><ispartof>Applied sciences, 2021-06, Vol.11 (11), p.4789, Article 4789</ispartof><rights>2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>true</woscitedreferencessubscribed><woscitedreferencescount>4</woscitedreferencescount><woscitedreferencesoriginalsourcerecordid>wos000659644000001</woscitedreferencesoriginalsourcerecordid><citedby>FETCH-LOGICAL-c364t-736e7ffa43e67b5553c374a484ec180fcc66b6bd1b691adadc4a5f1707634dae3</citedby><cites>FETCH-LOGICAL-c364t-736e7ffa43e67b5553c374a484ec180fcc66b6bd1b691adadc4a5f1707634dae3</cites><orcidid>0000-0001-9940-6526 ; 0000-0002-9493-8563</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785,865,2103,2115,27929,27930,39263</link.rule.ids></links><search><creatorcontrib>Peng, Fuping</creatorcontrib><creatorcontrib>Du, Jing</creatorcontrib><creatorcontrib>Du, Jialin</creatorcontrib><creatorcontrib>Wang, Simo</creatorcontrib><creatorcontrib>Yan, Wei</creatorcontrib><title>Contrast Analysis of Polarization in Three-Beam Interference Lithography</title><title>Applied sciences</title><addtitle>APPL SCI-BASEL</addtitle><description>This paper analyzes the effect of polarization and the incident angle on the contrasts of interference patterns in three-beam interference lithography. 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Du, Jing ; Du, Jialin ; Wang, Simo ; Yan, Wei</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c364t-736e7ffa43e67b5553c374a484ec180fcc66b6bd1b691adadc4a5f1707634dae3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Beams (radiation)</topic><topic>Chemistry</topic><topic>Chemistry, Multidisciplinary</topic><topic>Electric fields</topic><topic>Engineering</topic><topic>Engineering, Multidisciplinary</topic><topic>incident angle</topic><topic>interference lithography</topic><topic>Lasers</topic><topic>Light</topic><topic>Lithography</topic><topic>Materials Science</topic><topic>Materials Science, Multidisciplinary</topic><topic>pattern contrast</topic><topic>Physical Sciences</topic><topic>Physics</topic><topic>Physics, Applied</topic><topic>Polarization</topic><topic>Science & Technology</topic><topic>Technology</topic><topic>Theoretical analysis</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Peng, Fuping</creatorcontrib><creatorcontrib>Du, Jing</creatorcontrib><creatorcontrib>Du, Jialin</creatorcontrib><creatorcontrib>Wang, Simo</creatorcontrib><creatorcontrib>Yan, Wei</creatorcontrib><collection>Web of Science Core Collection</collection><collection>Science Citation Index Expanded</collection><collection>Web of Science - Science Citation Index Expanded - 2021</collection><collection>CrossRef</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central Korea</collection><collection>Access via ProQuest (Open Access)</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>DOAJ Directory of Open Access Journals</collection><jtitle>Applied sciences</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Peng, Fuping</au><au>Du, Jing</au><au>Du, Jialin</au><au>Wang, Simo</au><au>Yan, Wei</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Contrast Analysis of Polarization in Three-Beam Interference Lithography</atitle><jtitle>Applied sciences</jtitle><stitle>APPL SCI-BASEL</stitle><date>2021-06-01</date><risdate>2021</risdate><volume>11</volume><issue>11</issue><spage>4789</spage><pages>4789-</pages><artnum>4789</artnum><issn>2076-3417</issn><eissn>2076-3417</eissn><abstract>This paper analyzes the effect of polarization and the incident angle on the contrasts of interference patterns in three-beam interference lithography. A non-coplanar laser interference system was set up to simulate the relationship between contrast, beam polarization, and the incident angle. Different pattern periods require different incident angles, which means different contrast losses in interference lithography. Two different polarization modes were presented to study the effects of polarization with different incident angles based on theoretical analysis simulations. In the case of the co-directional component TE polarization mode, it was demonstrated that the pattern contrast decreases with the increase in the incident angle and the contrast loss caused by the polarization angle error also grew rapidly. By changing the mode to azimuthal (TE-TE-TE) polarization, the contrast of the interference pattern can be ensured to remain above 0.97 even though the incident angle is large. In addition, TE-TE-TE mode can accept larger polarization angle errors. 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| subjects | Beams (radiation) Chemistry Chemistry, Multidisciplinary Electric fields Engineering Engineering, Multidisciplinary incident angle interference lithography Lasers Light Lithography Materials Science Materials Science, Multidisciplinary pattern contrast Physical Sciences Physics Physics, Applied Polarization Science & Technology Technology Theoretical analysis |
| title | Contrast Analysis of Polarization in Three-Beam Interference Lithography |
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