Real-Time Plasma Uniformity Monitoring via Selective Plasma Light Intensity Measurement Using Transparent-LCD-Module-Adapted Optical Emission Spectroscopy

A real-time selective plasma light intensity measurement technique involving optical emission spectroscopy (OES) is proposed for process uniformity monitoring and detection in various plasma regions during semiconductor processing. Among plasma diagnostic techniques, OES is a noncontact plasma measu...

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Veröffentlicht in:	IEEE sensors journal 2021-01, Vol.21 (2), p.2256-2262
Hauptverfasser:	Kim, In Joong, Park, Chuntaek, Shin, Dongseok, Yun, Ilgu
Format:	Artikel
Sprache:	eng
Schlagworte:	Chambers Diagnostic systems Emission spectroscopy Engineering Engineering, Electrical & Electronic Inspection Instruments & Instrumentation Luminous intensity Measurement techniques Modules Monitoring Optical emission spectroscopy Optical emission spectroscopy (OES) Physical Sciences Physics Physics, Applied Plasma Plasma measurements plasma-assisted atomic layer deposition (PA-ALD) Plasmas process monitoring uniformity Real time Real-time systems Science & Technology Semiconductor device measurement semiconductor high-volume manufacturing Sensors Spectroscopic analysis Spectrum analysis Technology transparent liquid crystal display (TLCD)
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