Platinum omega-Alkenyl Compounds as Chemical Vapor Deposition Precursors. Mechanistic Studies of the Thermolysis of Pt[CH2CMe2CH2CH=CH2](2 )in Solution and the Origin of Rapid Nucleation

The compound cis-bis(eta(1),eta(2)-2,2-dimethylpent-4-en-1-yl)platinum, Pt-[CH2CMe2CH2CH=CH2](2 ) (3), is a recently discovered chemical vapor deposition (CVD) precursor for the deposition of highly smooth platinum thin films without nucleation delays on a variety of substrates. This paper describes...

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Veröffentlicht in:	Organometallics 2020-11, Vol.39 (21), p.3817-3829
Hauptverfasser:	Liu, Sumeng, Zhang, Zhejun, Abelson, John R., Girolami, Gregory S.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemistry Chemistry, Inorganic & Nuclear Chemistry, Organic Physical Sciences Science & Technology
Online-Zugang:	Volltext
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