Thermal Evaporation–Oxidation Deposited Aluminum Oxide as an Interfacial Modifier to Improve the Performance and Stability of Zinc Oxide-Based Planar Perovskite Solar Cells
The acid–base chemistry at the interface of zinc oxide (ZnO) and methylammonium lead tri-iodide (perovskite) leads to a proton transfer reaction that results in perovskite degradation. In perovskite solar cells (PSCs), this reaction produces low efficiency and reduces the long-term stability. In thi...
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Veröffentlicht in: | ACS applied energy materials 2020-10, Vol.3 (10), p.9618-9627 |
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Sprache: | eng |
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Zusammenfassung: | The acid–base chemistry at the interface of zinc oxide (ZnO) and methylammonium lead tri-iodide (perovskite) leads to a proton transfer reaction that results in perovskite degradation. In perovskite solar cells (PSCs), this reaction produces low efficiency and reduces the long-term stability. In this work, an aluminum (Al) layer of 1–2 nm thickness is thermally evaporated on top of ZnO or Al3+-doped ZnO (ZnO:Al) thin films and then annealed at 450 °C for 30 min. Thermal annealing converts the surface aluminum film into a transparent and approximately 2 nm thick aluminum oxide (AlO x ) layer. Also, a larger concentration of oxygen vacancies is obtained by the annealing of Al and attributed to the diffusion of Al into the ZnO surface, and the ZnO underlayer results in a more conductive material. As a result, the chemical stability of perovskite coatings on top of AlO x -coated ZnO films is significantly enhanced, and the flat-band level of ZnO shifts 0.09 eV upwards, which improves the energetic level alignment in PSCs. This allows us to obtain ZnO:Al/AlO x -based planar PSCs that show a maximum efficiency of 16.56% with the perovskite layer prepared in ambient conditions under a relative humidity of 40–50%. After continuous illumination of about 30 min in air, ZnO-based PSCs without AlO x layer retain only 34.5% of their original efficiency, whereas those with AlO x retain about 92.5%. It is demonstrated that thermal evaporation–oxidation is an efficient method to modify the surface properties of inorganic semiconductor thin films and improves both the performance and stability of PSCs. |
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ISSN: | 2574-0962 2574-0962 |
DOI: | 10.1021/acsaem.0c01106 |