Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films
Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing（RTA）. Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta205 thin film...
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| Veröffentlicht in: | Transactions of Nonferrous Metals Society of China 2009-04, Vol.19 (2), p.359-363 |
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| container_title | Transactions of Nonferrous Metals Society of China |
| container_volume | 19 |
| creator | 周继承 罗迪恬 李幼真 刘正 |
| description | Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing（RTA）. Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta205 thin films are amorphous. It takes hexagonal structure （δ-Ta2O5） after being annealed at 800 ℃. A transition from δ-Ta2O5 to orthorhombic structure （L-Ta2O5） occurs at 900-1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased. |
| doi_str_mv | 10.1016/S1003-6326(08)60278-2 |
| format | Article |
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Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta205 thin films are amorphous. It takes hexagonal structure （δ-Ta2O5） after being annealed at 800 ℃. A transition from δ-Ta2O5 to orthorhombic structure （L-Ta2O5） occurs at 900-1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.</description><identifier>ISSN: 1003-6326</identifier><identifier>DOI: 10.1016/S1003-6326(08)60278-2</identifier><language>eng</language><publisher>School of Physics Science and Technology, Central South University, Changsha 410083, China</publisher><subject>Ta2O5 ; 光学性质 ; 快速热退火 ; 直流反应磁控溅射 ; 薄膜沉积 ; 退火温度 ; 钽薄膜</subject><ispartof>Transactions of Nonferrous Metals Society of China, 2009-04, Vol.19 (2), p.359-363</ispartof><rights>Copyright © Wanfang Data Co. Ltd. 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Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta205 thin films are amorphous. It takes hexagonal structure （δ-Ta2O5） after being annealed at 800 ℃. A transition from δ-Ta2O5 to orthorhombic structure （L-Ta2O5） occurs at 900-1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.</description><subject>Ta2O5</subject><subject>光学性质</subject><subject>快速热退火</subject><subject>直流反应磁控溅射</subject><subject>薄膜沉积</subject><subject>退火温度</subject><subject>钽薄膜</subject><issn>1003-6326</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNo9kE1LxDAQhntQUFd_glA8iCLVSdKmm6OIX7DgwfUcZtPJ2rWbdpMWXX-92Q88Dbx53snwJMk5g1sGTN69MwCRScHlFYyvJfBynPGD5Pg_PkpOQlgA5LmU7Dgxj9aS6dPWpqEb-p587eZp5ymEwVOKrko9dnWV9p_kl9jExBE2G6h1adv1tYlh59uOfF9T2CyaIn8rYqF2qa2bZThNDi02gc72c5R8PD1OH16yydvz68P9JDNCqT4bk6pkqQoFGGchiaisOOOWm1mhBOYSKokolRA5MyiqclbFVzASVVHmVoySm93eb3QW3Vwv2sG7-KP-na_DIvzMNHEABTyaivTljo7HrwYKvV7WwVDToKN2CFrkHHJWiAgWO9D4NgRPVne-XqJfawZ6I11vpeuNXQ1jvZWueexd7HufrZuvojI9Q_MVlZDmSgmV81L8AdaCgyI</recordid><startdate>20090401</startdate><enddate>20090401</enddate><creator>周继承 罗迪恬 李幼真 刘正</creator><general>School of Physics Science and Technology, Central South University, Changsha 410083, China</general><scope>2RA</scope><scope>92L</scope><scope>CQIGP</scope><scope>W92</scope><scope>~WA</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>2B.</scope><scope>4A8</scope><scope>92I</scope><scope>93N</scope><scope>PSX</scope><scope>TCJ</scope></search><sort><creationdate>20090401</creationdate><title>Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films</title><author>周继承 罗迪恬 李幼真 刘正</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c399t-8e9d679590ad6756eee7d212f2cb593a460d6aa693341ca3d7bd12f0c6a9574f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Ta2O5</topic><topic>光学性质</topic><topic>快速热退火</topic><topic>直流反应磁控溅射</topic><topic>薄膜沉积</topic><topic>退火温度</topic><topic>钽薄膜</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>周继承 罗迪恬 李幼真 刘正</creatorcontrib><collection>中文科技期刊数据库</collection><collection>中文科技期刊数据库-CALIS站点</collection><collection>中文科技期刊数据库-7.0平台</collection><collection>中文科技期刊数据库-工程技术</collection><collection>中文科技期刊数据库- 镜像站点</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Wanfang Data Journals - Hong Kong</collection><collection>WANFANG Data Centre</collection><collection>Wanfang Data Journals</collection><collection>万方数据期刊 - 香港版</collection><collection>China Online Journals (COJ)</collection><collection>China Online Journals (COJ)</collection><jtitle>Transactions of Nonferrous Metals Society of China</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>周继承 罗迪恬 李幼真 刘正</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films</atitle><jtitle>Transactions of Nonferrous Metals Society of China</jtitle><addtitle>Transactions of Nonferrous Metals Society of China</addtitle><date>2009-04-01</date><risdate>2009</risdate><volume>19</volume><issue>2</issue><spage>359</spage><epage>363</epage><pages>359-363</pages><issn>1003-6326</issn><abstract>Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing（RTA）. Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta205 thin films are amorphous. It takes hexagonal structure （δ-Ta2O5） after being annealed at 800 ℃. A transition from δ-Ta2O5 to orthorhombic structure （L-Ta2O5） occurs at 900-1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.</abstract><pub>School of Physics Science and Technology, Central South University, Changsha 410083, China</pub><doi>10.1016/S1003-6326(08)60278-2</doi><tpages>5</tpages></addata></record> |
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| identifier | ISSN: 1003-6326 |
| ispartof | Transactions of Nonferrous Metals Society of China, 2009-04, Vol.19 (2), p.359-363 |
| issn | 1003-6326 |
| language | eng |
| recordid | cdi_wanfang_journals_zgysjsxb_e200902016 |
| source | Elsevier ScienceDirect Journals Complete; Alma/SFX Local Collection |
| subjects | Ta2O5 光学性质 快速热退火 直流反应磁控溅射 薄膜沉积 退火温度 钽薄膜 |
| title | Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films |
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