Characterization of CuInS2 thin films prepared by sulfurization of Cu-In precursor

CuInS2 thin films were prepared by sulfurization of Cu-In precursors. The influences of the deposition sequence of Cu and In layers, such as Cu/In, Cu/In/In, and In/Cu/In, on structure, topography, and optical properties of CuInS2 thin films were investigated. X-ray diffraction results show that the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Transactions of Nonferrous Metals Society of China 2008-10, Vol.18 (5), p.1083-1088
1. Verfasser: 阎有花 刘迎春 方玲 朱景森 赵海花 李德仁 卢志超 周少雄
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 1088
container_issue 5
container_start_page 1083
container_title Transactions of Nonferrous Metals Society of China
container_volume 18
creator 阎有花 刘迎春 方玲 朱景森 赵海花 李德仁 卢志超 周少雄
description CuInS2 thin films were prepared by sulfurization of Cu-In precursors. The influences of the deposition sequence of Cu and In layers, such as Cu/In, Cu/In/In, and In/Cu/In, on structure, topography, and optical properties of CuInS2 thin films were investigated. X-ray diffraction results show that the deposition sequence of Cu and In layers affects the crystalline quality of CuInS2 films. Atomic force microstructure images reveal that the grain size and surface roughness are related to the deposition sequence used. When the deposition sequence of precursor is In/Cu/In, the CuInS2 thin films show a single-phase chalcopyrite structure with (112) preferred orientation. The surface morphology of CIS films is uniform and compacted. The absorption coefficient is larger than 10^4 cm^-1 with optical band gap Egclose to 1.4 eV.
doi_str_mv 10.1016/S1003-6326(08)60185-5
format Article
fullrecord <record><control><sourceid>wanfang_jour_proqu</sourceid><recordid>TN_cdi_wanfang_journals_zgysjsxb_e200805011</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><cqvip_id>28334849</cqvip_id><wanfj_id>zgysjsxb_e200805011</wanfj_id><sourcerecordid>zgysjsxb_e200805011</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2621-ab10c42a5576237aa1f4871309456e4af23450b9b7bb46b9837202471a97b2ae3</originalsourceid><addsrcrecordid>eNpVkNtKw0AQhnOhYK0-ghC8EEWis8dsLqV4KBQEq9fLbNy0qekm3U3Q9ulNDwheDQzf_8_wRdEFgTsCRN5PCQBLJKPyGtSNBKJEIo6iwd_6JDoNYQHAuZRkEL2N5ugxb60vN9iWtYvrIh51YzelcTsvXVyU1TLEjbcNevsZm3Ucuqro_uPJ2G2RvPOh9mfRcYFVsOeHOYw-nh7fRy_J5PV5PHqYJDmVlCRoCOScohCppCxFJAVXKWGQcSEtx4IyLsBkJjWGS5MpllKgPCWYpYaiZcPodt_7ja5AN9OLuvOuv6g3s3VYhB-jLQVQIICQnr7a042vV50NrV6WIbdVhc7WXdCMy_6CYj0o9mDu6xC8LXTjyyX6tSagt471zrHeytSg9M6xFn3u8pCb1262KvuHDOZfvT-rad_LFc_YL63Je5I</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>34683783</pqid></control><display><type>article</type><title>Characterization of CuInS2 thin films prepared by sulfurization of Cu-In precursor</title><source>Elsevier ScienceDirect Journals</source><source>Alma/SFX Local Collection</source><creator>阎有花 刘迎春 方玲 朱景森 赵海花 李德仁 卢志超 周少雄</creator><creatorcontrib>阎有花 刘迎春 方玲 朱景森 赵海花 李德仁 卢志超 周少雄</creatorcontrib><description>CuInS2 thin films were prepared by sulfurization of Cu-In precursors. The influences of the deposition sequence of Cu and In layers, such as Cu/In, Cu/In/In, and In/Cu/In, on structure, topography, and optical properties of CuInS2 thin films were investigated. X-ray diffraction results show that the deposition sequence of Cu and In layers affects the crystalline quality of CuInS2 films. Atomic force microstructure images reveal that the grain size and surface roughness are related to the deposition sequence used. When the deposition sequence of precursor is In/Cu/In, the CuInS2 thin films show a single-phase chalcopyrite structure with (112) preferred orientation. The surface morphology of CIS films is uniform and compacted. The absorption coefficient is larger than 10^4 cm^-1 with optical band gap Egclose to 1.4 eV.</description><identifier>ISSN: 1003-6326</identifier><identifier>DOI: 10.1016/S1003-6326(08)60185-5</identifier><language>eng</language><publisher>China Iron &amp; Steel Research Institute Group, Advanced Technology &amp; Materials Co. Ltd., Beijing 100081, China</publisher><subject>沉积层序 ; 金属学 ; 铜铟薄膜</subject><ispartof>Transactions of Nonferrous Metals Society of China, 2008-10, Vol.18 (5), p.1083-1088</ispartof><rights>Copyright © Wanfang Data Co. Ltd. All Rights Reserved.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2621-ab10c42a5576237aa1f4871309456e4af23450b9b7bb46b9837202471a97b2ae3</citedby><cites>FETCH-LOGICAL-c2621-ab10c42a5576237aa1f4871309456e4af23450b9b7bb46b9837202471a97b2ae3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttp://image.cqvip.com/vip1000/qk/85276X/85276X.jpg</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids></links><search><creatorcontrib>阎有花 刘迎春 方玲 朱景森 赵海花 李德仁 卢志超 周少雄</creatorcontrib><title>Characterization of CuInS2 thin films prepared by sulfurization of Cu-In precursor</title><title>Transactions of Nonferrous Metals Society of China</title><addtitle>Transactions of Nonferrous Metals Society of China</addtitle><description>CuInS2 thin films were prepared by sulfurization of Cu-In precursors. The influences of the deposition sequence of Cu and In layers, such as Cu/In, Cu/In/In, and In/Cu/In, on structure, topography, and optical properties of CuInS2 thin films were investigated. X-ray diffraction results show that the deposition sequence of Cu and In layers affects the crystalline quality of CuInS2 films. Atomic force microstructure images reveal that the grain size and surface roughness are related to the deposition sequence used. When the deposition sequence of precursor is In/Cu/In, the CuInS2 thin films show a single-phase chalcopyrite structure with (112) preferred orientation. The surface morphology of CIS films is uniform and compacted. The absorption coefficient is larger than 10^4 cm^-1 with optical band gap Egclose to 1.4 eV.</description><subject>沉积层序</subject><subject>金属学</subject><subject>铜铟薄膜</subject><issn>1003-6326</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNpVkNtKw0AQhnOhYK0-ghC8EEWis8dsLqV4KBQEq9fLbNy0qekm3U3Q9ulNDwheDQzf_8_wRdEFgTsCRN5PCQBLJKPyGtSNBKJEIo6iwd_6JDoNYQHAuZRkEL2N5ugxb60vN9iWtYvrIh51YzelcTsvXVyU1TLEjbcNevsZm3Ucuqro_uPJ2G2RvPOh9mfRcYFVsOeHOYw-nh7fRy_J5PV5PHqYJDmVlCRoCOScohCppCxFJAVXKWGQcSEtx4IyLsBkJjWGS5MpllKgPCWYpYaiZcPodt_7ja5AN9OLuvOuv6g3s3VYhB-jLQVQIICQnr7a042vV50NrV6WIbdVhc7WXdCMy_6CYj0o9mDu6xC8LXTjyyX6tSagt471zrHeytSg9M6xFn3u8pCb1262KvuHDOZfvT-rad_LFc_YL63Je5I</recordid><startdate>200810</startdate><enddate>200810</enddate><creator>阎有花 刘迎春 方玲 朱景森 赵海花 李德仁 卢志超 周少雄</creator><general>China Iron &amp; Steel Research Institute Group, Advanced Technology &amp; Materials Co. Ltd., Beijing 100081, China</general><scope>2RA</scope><scope>92L</scope><scope>CQIGP</scope><scope>W92</scope><scope>~WA</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>H8G</scope><scope>JG9</scope><scope>2B.</scope><scope>4A8</scope><scope>92I</scope><scope>93N</scope><scope>PSX</scope><scope>TCJ</scope></search><sort><creationdate>200810</creationdate><title>Characterization of CuInS2 thin films prepared by sulfurization of Cu-In precursor</title><author>阎有花 刘迎春 方玲 朱景森 赵海花 李德仁 卢志超 周少雄</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2621-ab10c42a5576237aa1f4871309456e4af23450b9b7bb46b9837202471a97b2ae3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>沉积层序</topic><topic>金属学</topic><topic>铜铟薄膜</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>阎有花 刘迎春 方玲 朱景森 赵海花 李德仁 卢志超 周少雄</creatorcontrib><collection>中文科技期刊数据库</collection><collection>中文科技期刊数据库-CALIS站点</collection><collection>中文科技期刊数据库-7.0平台</collection><collection>中文科技期刊数据库-工程技术</collection><collection>中文科技期刊数据库- 镜像站点</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Copper Technical Reference Library</collection><collection>Materials Research Database</collection><collection>Wanfang Data Journals - Hong Kong</collection><collection>WANFANG Data Centre</collection><collection>Wanfang Data Journals</collection><collection>万方数据期刊 - 香港版</collection><collection>China Online Journals (COJ)</collection><collection>China Online Journals (COJ)</collection><jtitle>Transactions of Nonferrous Metals Society of China</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>阎有花 刘迎春 方玲 朱景森 赵海花 李德仁 卢志超 周少雄</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characterization of CuInS2 thin films prepared by sulfurization of Cu-In precursor</atitle><jtitle>Transactions of Nonferrous Metals Society of China</jtitle><addtitle>Transactions of Nonferrous Metals Society of China</addtitle><date>2008-10</date><risdate>2008</risdate><volume>18</volume><issue>5</issue><spage>1083</spage><epage>1088</epage><pages>1083-1088</pages><issn>1003-6326</issn><abstract>CuInS2 thin films were prepared by sulfurization of Cu-In precursors. The influences of the deposition sequence of Cu and In layers, such as Cu/In, Cu/In/In, and In/Cu/In, on structure, topography, and optical properties of CuInS2 thin films were investigated. X-ray diffraction results show that the deposition sequence of Cu and In layers affects the crystalline quality of CuInS2 films. Atomic force microstructure images reveal that the grain size and surface roughness are related to the deposition sequence used. When the deposition sequence of precursor is In/Cu/In, the CuInS2 thin films show a single-phase chalcopyrite structure with (112) preferred orientation. The surface morphology of CIS films is uniform and compacted. The absorption coefficient is larger than 10^4 cm^-1 with optical band gap Egclose to 1.4 eV.</abstract><pub>China Iron &amp; Steel Research Institute Group, Advanced Technology &amp; Materials Co. Ltd., Beijing 100081, China</pub><doi>10.1016/S1003-6326(08)60185-5</doi><tpages>6</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1003-6326
ispartof Transactions of Nonferrous Metals Society of China, 2008-10, Vol.18 (5), p.1083-1088
issn 1003-6326
language eng
recordid cdi_wanfang_journals_zgysjsxb_e200805011
source Elsevier ScienceDirect Journals; Alma/SFX Local Collection
subjects 沉积层序
金属学
铜铟薄膜
title Characterization of CuInS2 thin films prepared by sulfurization of Cu-In precursor
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T07%3A57%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-wanfang_jour_proqu&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Characterization%20of%20CuInS2%20thin%20films%20prepared%20by%20sulfurization%20of%20Cu-In%20precursor&rft.jtitle=Transactions%20of%20Nonferrous%20Metals%20Society%20of%20China&rft.au=%E9%98%8E%E6%9C%89%E8%8A%B1%20%E5%88%98%E8%BF%8E%E6%98%A5%20%E6%96%B9%E7%8E%B2%20%E6%9C%B1%E6%99%AF%E6%A3%AE%20%E8%B5%B5%E6%B5%B7%E8%8A%B1%20%E6%9D%8E%E5%BE%B7%E4%BB%81%20%E5%8D%A2%E5%BF%97%E8%B6%85%20%E5%91%A8%E5%B0%91%E9%9B%84&rft.date=2008-10&rft.volume=18&rft.issue=5&rft.spage=1083&rft.epage=1088&rft.pages=1083-1088&rft.issn=1003-6326&rft_id=info:doi/10.1016/S1003-6326(08)60185-5&rft_dat=%3Cwanfang_jour_proqu%3Ezgysjsxb_e200805011%3C/wanfang_jour_proqu%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=34683783&rft_id=info:pmid/&rft_cqvip_id=28334849&rft_wanfj_id=zgysjsxb_e200805011&rfr_iscdi=true