Pulsed DC plasma enhanced chemical vapor deposited TiN/Ti(C, N) multilayer coatings
Titanium nitride single coatings and TiN/Ti(C,N) multilayer coatings deposited on Cr12MoV substrate have been completed by pulsed DC plasma enhanced chemical vapor deposition (PCVD) process. The SEM, XRD and microvicker's hardness and the indentation test were used to study the microstructure a...
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| Veröffentlicht in: | Transactions of Nonferrous Metals Society of China 2000-08, Vol.10 (4), p.489-492 |
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| container_title | Transactions of Nonferrous Metals Society of China |
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| creator | Ma, S L Li, Y.-H.,-- Nan, J.-M.,-- Xu, K.-W.,-- |
| description | Titanium nitride single coatings and TiN/Ti(C,N) multilayer coatings deposited on Cr12MoV substrate have been completed by pulsed DC plasma enhanced chemical vapor deposition (PCVD) process. The SEM, XRD and microvicker's hardness and the indentation test were used to study the microstructure and mechanical properties of TiN/Ti(C,N) multilayer coatings. The results show that TiN/Ti(C,N) coatings are fine and have free-column structure, and carbon atoms take the place of some nitrogen atoms in Ti(C,N) coatings when lower flow ratio of CH sub 4 is used. The microvicker's hardness and interfacial adhesion between TiN/Ti(C,N) coatings and Cr12MoV substrate increases more obviously than that of titanium nitride single hard coatings due to the more dense and free-column structure when process is optimized. |
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The SEM, XRD and microvicker's hardness and the indentation test were used to study the microstructure and mechanical properties of TiN/Ti(C,N) multilayer coatings. The results show that TiN/Ti(C,N) coatings are fine and have free-column structure, and carbon atoms take the place of some nitrogen atoms in Ti(C,N) coatings when lower flow ratio of CH sub 4 is used. The microvicker's hardness and interfacial adhesion between TiN/Ti(C,N) coatings and Cr12MoV substrate increases more obviously than that of titanium nitride single hard coatings due to the more dense and free-column structure when process is optimized.</description><identifier>ISSN: 1003-6326</identifier><language>eng</language><ispartof>Transactions of Nonferrous Metals Society of China, 2000-08, Vol.10 (4), p.489-492</ispartof><rights>Copyright © Wanfang Data Co. Ltd. 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The SEM, XRD and microvicker's hardness and the indentation test were used to study the microstructure and mechanical properties of TiN/Ti(C,N) multilayer coatings. The results show that TiN/Ti(C,N) coatings are fine and have free-column structure, and carbon atoms take the place of some nitrogen atoms in Ti(C,N) coatings when lower flow ratio of CH sub 4 is used. The microvicker's hardness and interfacial adhesion between TiN/Ti(C,N) coatings and Cr12MoV substrate increases more obviously than that of titanium nitride single hard coatings due to the more dense and free-column structure when process is optimized.</description><issn>1003-6326</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNotTc1OwzAY6wEkxuAdckIgqEjzZSk9osIAaRpIjHP15adbqjQtTQuMpyfS8MGWbMs-SmYZpZAKYOIkOQ2hoZRzIbJZ8v42uWA0eShJ7zC0SIzfoVfRUjvTWoWOfGHfDUSbvgt2jMHGrm839rK8Iesr0k5utA73ZiCqw9H6bThLjmuMq-f_Ok8-lo-b8jldvT69lPertGeMjmkBklOWaamUAiVQi6zGAgG4vqP5IstzqQpNI0nOUEqEnNMYAhjkstYwT64Pu9_oa_TbqummwcfH6ne7D034kZVhNILTTMT2xaHdD93nZMJYtTYo4xx6002hYrlYcAAKf8pwW4E</recordid><startdate>20000801</startdate><enddate>20000801</enddate><creator>Ma, S L</creator><creator>Li, Y.-H.,--</creator><creator>Nan, J.-M.,--</creator><creator>Xu, K.-W.,--</creator><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>2B.</scope><scope>4A8</scope><scope>92I</scope><scope>93N</scope><scope>PSX</scope><scope>TCJ</scope></search><sort><creationdate>20000801</creationdate><title>Pulsed DC plasma enhanced chemical vapor deposited TiN/Ti(C, N) multilayer coatings</title><author>Ma, S L ; Li, Y.-H.,-- ; Nan, J.-M.,-- ; Xu, K.-W.,--</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p220t-93b4021dbccc3c6ad61fa9a334d8075177bc9d0bc9b42abba374034d33ea4bfd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ma, S L</creatorcontrib><creatorcontrib>Li, Y.-H.,--</creatorcontrib><creatorcontrib>Nan, J.-M.,--</creatorcontrib><creatorcontrib>Xu, K.-W.,--</creatorcontrib><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Wanfang Data Journals - Hong Kong</collection><collection>WANFANG Data Centre</collection><collection>Wanfang Data Journals</collection><collection>万方数据期刊 - 香港版</collection><collection>China Online Journals (COJ)</collection><collection>China Online Journals (COJ)</collection><jtitle>Transactions of Nonferrous Metals Society of China</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ma, S L</au><au>Li, Y.-H.,--</au><au>Nan, J.-M.,--</au><au>Xu, K.-W.,--</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Pulsed DC plasma enhanced chemical vapor deposited TiN/Ti(C, N) multilayer coatings</atitle><jtitle>Transactions of Nonferrous Metals Society of China</jtitle><date>2000-08-01</date><risdate>2000</risdate><volume>10</volume><issue>4</issue><spage>489</spage><epage>492</epage><pages>489-492</pages><issn>1003-6326</issn><abstract>Titanium nitride single coatings and TiN/Ti(C,N) multilayer coatings deposited on Cr12MoV substrate have been completed by pulsed DC plasma enhanced chemical vapor deposition (PCVD) process. The SEM, XRD and microvicker's hardness and the indentation test were used to study the microstructure and mechanical properties of TiN/Ti(C,N) multilayer coatings. The results show that TiN/Ti(C,N) coatings are fine and have free-column structure, and carbon atoms take the place of some nitrogen atoms in Ti(C,N) coatings when lower flow ratio of CH sub 4 is used. The microvicker's hardness and interfacial adhesion between TiN/Ti(C,N) coatings and Cr12MoV substrate increases more obviously than that of titanium nitride single hard coatings due to the more dense and free-column structure when process is optimized.</abstract><tpages>4</tpages></addata></record> |
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| source | Alma/SFX Local Collection |
| title | Pulsed DC plasma enhanced chemical vapor deposited TiN/Ti(C, N) multilayer coatings |
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