Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature
Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influence of oxygen gas content on the structural and optical properties of ZnO thin films was st...
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| Veröffentlicht in: | Rare metals 2011-04, Vol.30 (2), p.170-174 |
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| creator | Liu, Baoting Zhou, Yang Zheng, Hongfang Li, Man Guo, Zhe Zhao, Qingxun Peng, Yingcai |
| description | Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influence of oxygen gas content on the structural and optical properties of ZnO thin films was studied by a surface profile measuring system, X-ray diffraction analysis, atomic force microscopy, and UV spectro- photometry. It is found that the size of ZnO crystalline grains increases first and then decreases with the increase of oxygen gas content, and the maximum grain size locates at the 25% oxygen gas content. The crystalline quality and average optical transmittance （〉90%） in the visi- ble-light region of the ZnO film prepared at an oxygen gas content of 25% are better than those of ZnO films at the other contents. The obtained results can be attributed to the resputtefing by energetic oxygen anions in the growing process. |
| doi_str_mv | 10.1007/s12598-011-0219-3 |
| format | Article |
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The influence of oxygen gas content on the structural and optical properties of ZnO thin films was studied by a surface profile measuring system, X-ray diffraction analysis, atomic force microscopy, and UV spectro- photometry. It is found that the size of ZnO crystalline grains increases first and then decreases with the increase of oxygen gas content, and the maximum grain size locates at the 25% oxygen gas content. The crystalline quality and average optical transmittance （〉90%） in the visi- ble-light region of the ZnO film prepared at an oxygen gas content of 25% are better than those of ZnO films at the other contents. The obtained results can be attributed to the resputtefing by energetic oxygen anions in the growing process.</description><identifier>ISSN: 1001-0521</identifier><identifier>EISSN: 1867-7185</identifier><identifier>DOI: 10.1007/s12598-011-0219-3</identifier><language>eng</language><publisher>Beijing: The Nonferrous Metals Society of China, General Research Institute for Nonferrous Metals</publisher><subject>Biomaterials ; Chemistry and Materials Science ; Crystal structure ; Deposition ; Energy ; Grain size ; Magnetron sputtering ; Materials Engineering ; Materials Science ; Metallic Materials ; Nanoscale Science and Technology ; Optical properties ; Physical Chemistry ; Radio frequencies ; RF磁控溅射 ; Thin films ; Zinc oxide ; ZnO薄膜 ; 光学特性 ; 射线衍射分析 ; 氧化锌薄膜 ; 氧气含量</subject><ispartof>Rare metals, 2011-04, Vol.30 (2), p.170-174</ispartof><rights>The Nonferrous Metals Society of China and Springer-Verlag Berlin Heidelberg 2011</rights><rights>Copyright © Wanfang Data Co. Ltd. All Rights Reserved.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c472t-2f878b123bcf884d7b8fcd6dde3b15094f6b99f836f23c7a1e8e11dcf01b1b453</citedby><cites>FETCH-LOGICAL-c472t-2f878b123bcf884d7b8fcd6dde3b15094f6b99f836f23c7a1e8e11dcf01b1b453</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttp://image.cqvip.com/vip1000/qk/85314X/85314X.jpg</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s12598-011-0219-3$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s12598-011-0219-3$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,776,780,27901,27902,41464,42533,51294</link.rule.ids></links><search><creatorcontrib>Liu, Baoting</creatorcontrib><creatorcontrib>Zhou, Yang</creatorcontrib><creatorcontrib>Zheng, Hongfang</creatorcontrib><creatorcontrib>Li, Man</creatorcontrib><creatorcontrib>Guo, Zhe</creatorcontrib><creatorcontrib>Zhao, Qingxun</creatorcontrib><creatorcontrib>Peng, Yingcai</creatorcontrib><title>Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature</title><title>Rare metals</title><addtitle>Rare Metals</addtitle><addtitle>Rare Metals</addtitle><description>Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influence of oxygen gas content on the structural and optical properties of ZnO thin films was studied by a surface profile measuring system, X-ray diffraction analysis, atomic force microscopy, and UV spectro- photometry. It is found that the size of ZnO crystalline grains increases first and then decreases with the increase of oxygen gas content, and the maximum grain size locates at the 25% oxygen gas content. The crystalline quality and average optical transmittance （〉90%） in the visi- ble-light region of the ZnO film prepared at an oxygen gas content of 25% are better than those of ZnO films at the other contents. The obtained results can be attributed to the resputtefing by energetic oxygen anions in the growing process.</description><subject>Biomaterials</subject><subject>Chemistry and Materials Science</subject><subject>Crystal structure</subject><subject>Deposition</subject><subject>Energy</subject><subject>Grain size</subject><subject>Magnetron sputtering</subject><subject>Materials Engineering</subject><subject>Materials Science</subject><subject>Metallic Materials</subject><subject>Nanoscale Science and Technology</subject><subject>Optical properties</subject><subject>Physical Chemistry</subject><subject>Radio frequencies</subject><subject>RF磁控溅射</subject><subject>Thin films</subject><subject>Zinc oxide</subject><subject>ZnO薄膜</subject><subject>光学特性</subject><subject>射线衍射分析</subject><subject>氧化锌薄膜</subject><subject>氧气含量</subject><issn>1001-0521</issn><issn>1867-7185</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><sourceid>BENPR</sourceid><recordid>eNp9kc9qFTEUxgdRsNY-gLvgxtVoTuZPkqUUWwuFgtRNNyHJnEznOpNMkwz2Pkdf2FxuseDCTXIgv-87J-erqg9APwOl_EsC1klRU4CaMpB186o6AdHzmoPoXpea0vLSMXhbvUtpR2nb9j09qZ6uvJs39BZJcCQ87kf0ZNSJ2OAz-kyCJ_keScpxs3mLeibaDySsebKlXmNYMeYJ00F-528KPHnipnlJZMA1pCnjQMye_Lggix495lgc07rljHHyI9GZxBAWknEpTrq0wPfVG6fnhGfP92n18-Lb7fn3-vrm8ur863VtW85yzZzgwgBrjHVCtAM3wtmhHwZsDHRUtq43UjrR9I41lmtAgQCDdRQMmLZrTqtPR9_f2jvtR7ULW_Slo3rc75JCVrZJy9G-kOW_DxumrJYpWZxn7TFsSUnKZcekkIX8-A_511R0ggOVwAsER8jGkFJEp9Y4LTruFVB1iFMd41RlAHWIUzVFw46atB72hvHF-H-i52nsffDjQ9Epo-2vEg-qhjPWcwnNH0VOsGY</recordid><startdate>20110401</startdate><enddate>20110401</enddate><creator>Liu, Baoting</creator><creator>Zhou, Yang</creator><creator>Zheng, Hongfang</creator><creator>Li, Man</creator><creator>Guo, Zhe</creator><creator>Zhao, Qingxun</creator><creator>Peng, Yingcai</creator><general>The Nonferrous Metals Society of China, General Research Institute for Nonferrous Metals</general><general>Springer Nature B.V</general><general>College of Physics Science and Technology,Hebei University,Banding 071002,China%Banding University,Banding 071000,China%College of Electronic and Information Engineering,Hebei University,Banding 071002,China</general><scope>2RA</scope><scope>92L</scope><scope>CQIGP</scope><scope>W94</scope><scope>~WA</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>2B.</scope><scope>4A8</scope><scope>92I</scope><scope>93N</scope><scope>PSX</scope><scope>TCJ</scope></search><sort><creationdate>20110401</creationdate><title>Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature</title><author>Liu, Baoting ; Zhou, Yang ; Zheng, Hongfang ; Li, Man ; Guo, Zhe ; Zhao, Qingxun ; Peng, Yingcai</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c472t-2f878b123bcf884d7b8fcd6dde3b15094f6b99f836f23c7a1e8e11dcf01b1b453</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Biomaterials</topic><topic>Chemistry and Materials Science</topic><topic>Crystal structure</topic><topic>Deposition</topic><topic>Energy</topic><topic>Grain size</topic><topic>Magnetron sputtering</topic><topic>Materials Engineering</topic><topic>Materials Science</topic><topic>Metallic Materials</topic><topic>Nanoscale Science and Technology</topic><topic>Optical properties</topic><topic>Physical Chemistry</topic><topic>Radio frequencies</topic><topic>RF磁控溅射</topic><topic>Thin films</topic><topic>Zinc oxide</topic><topic>ZnO薄膜</topic><topic>光学特性</topic><topic>射线衍射分析</topic><topic>氧化锌薄膜</topic><topic>氧气含量</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Liu, Baoting</creatorcontrib><creatorcontrib>Zhou, Yang</creatorcontrib><creatorcontrib>Zheng, Hongfang</creatorcontrib><creatorcontrib>Li, Man</creatorcontrib><creatorcontrib>Guo, Zhe</creatorcontrib><creatorcontrib>Zhao, Qingxun</creatorcontrib><creatorcontrib>Peng, Yingcai</creatorcontrib><collection>中文科技期刊数据库</collection><collection>中文科技期刊数据库-CALIS站点</collection><collection>中文科技期刊数据库-7.0平台</collection><collection>中文科技期刊数据库-自然科学</collection><collection>中文科技期刊数据库- 镜像站点</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>Wanfang Data Journals - Hong Kong</collection><collection>WANFANG Data Centre</collection><collection>Wanfang Data Journals</collection><collection>万方数据期刊 - 香港版</collection><collection>China Online Journals (COJ)</collection><collection>China Online Journals (COJ)</collection><jtitle>Rare metals</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Liu, Baoting</au><au>Zhou, Yang</au><au>Zheng, Hongfang</au><au>Li, Man</au><au>Guo, Zhe</au><au>Zhao, Qingxun</au><au>Peng, Yingcai</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature</atitle><jtitle>Rare metals</jtitle><stitle>Rare Metals</stitle><addtitle>Rare Metals</addtitle><date>2011-04-01</date><risdate>2011</risdate><volume>30</volume><issue>2</issue><spage>170</spage><epage>174</epage><pages>170-174</pages><issn>1001-0521</issn><eissn>1867-7185</eissn><abstract>Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influence of oxygen gas content on the structural and optical properties of ZnO thin films was studied by a surface profile measuring system, X-ray diffraction analysis, atomic force microscopy, and UV spectro- photometry. It is found that the size of ZnO crystalline grains increases first and then decreases with the increase of oxygen gas content, and the maximum grain size locates at the 25% oxygen gas content. The crystalline quality and average optical transmittance （〉90%） in the visi- ble-light region of the ZnO film prepared at an oxygen gas content of 25% are better than those of ZnO films at the other contents. The obtained results can be attributed to the resputtefing by energetic oxygen anions in the growing process.</abstract><cop>Beijing</cop><pub>The Nonferrous Metals Society of China, General Research Institute for Nonferrous Metals</pub><doi>10.1007/s12598-011-0219-3</doi><tpages>5</tpages></addata></record> |
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| ispartof | Rare metals, 2011-04, Vol.30 (2), p.170-174 |
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| source | Springer Nature - Complete Springer Journals; Alma/SFX Local Collection |
| subjects | Biomaterials Chemistry and Materials Science Crystal structure Deposition Energy Grain size Magnetron sputtering Materials Engineering Materials Science Metallic Materials Nanoscale Science and Technology Optical properties Physical Chemistry Radio frequencies RF磁控溅射 Thin films Zinc oxide ZnO薄膜 光学特性 射线衍射分析 氧化锌薄膜 氧气含量 |
| title | Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature |
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