Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering

TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system. The crystalline structures, morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and ultraviolet spectrophotom...

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Veröffentlicht in:	Journal of environmental sciences (China) 2009, Vol.21 (6), p.741-744
Hauptverfasser:	Zhang, Can, Ding, Wanyu, Wang, Hualin, Chai, Weiping, Ju, Dongying
Format:	Artikel
Sprache:	eng
Schlagworte:	Azo Compounds - chemistry Electrochemical Techniques Indicators and Reagents - chemistry Microscopy, Atomic Force Pressure Temperature Titanium - chemistry X-Ray Diffraction
Online-Zugang:	Volltext
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