Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering
TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system. The crystalline structures, morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and ultraviolet spectrophotom...
Gespeichert in:
| Veröffentlicht in: | Journal of environmental sciences (China) 2009, Vol.21 (6), p.741-744 |
|---|---|
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 744 |
|---|---|
| container_issue | 6 |
| container_start_page | 741 |
| container_title | Journal of environmental sciences (China) |
| container_volume | 21 |
| creator | Zhang, Can Ding, Wanyu Wang, Hualin Chai, Weiping Ju, Dongying |
| description | TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system. The crystalline structures, morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and ultraviolet spectrophotometer, respectively. The results indicated that working pressure was the key deposition parameter influencing the TiO2 film phase composition at room temperature, which directly affected its photocatalytic activity. With increasing working pressure, the target self-bias decreases monotonously. Therefore, low temperature TiO2 phase (anatase) could be deposited with high working pressure. The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution, which the degradation rate reached the maximum (35%) after irradiation by ultraviolet light for 1 h. |
| doi_str_mv | 10.1016/s1001-0742(08)62334-7 |
| format | Article |
| fullrecord | <record><control><sourceid>wanfang_jour_proqu</sourceid><recordid>TN_cdi_wanfang_journals_jes_e200906006</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><wanfj_id>jes_e200906006</wanfj_id><sourcerecordid>jes_e200906006</sourcerecordid><originalsourceid>FETCH-LOGICAL-c456t-f6988fdb5de2848df52f7247f4295006f5f25ea86ca6743339351536820727bc3</originalsourceid><addsrcrecordid>eNpFkMtOwzAQRb0A8f4EkFcIFoGJHT-yROUpVeoCWFtpMq5SEjvYiRB_j0srWM1o5t47mkPIeQ43OeTyNuYAeQaqYFegryXjvMjUHjn6Gx-S4xjXAFAIEAfkMC81cFDyiNgXZ7sJXY2Reku_fPho3YoOAWOcAlLvUu8HDGObFNYH-tYuGLVt10fa4OBjO2JDl9_0fkaHqYtI-2rlcAzJGYdpHDGkwFOyb6u0PNvVE_L--PA2e87mi6eX2d08qwshx8zKUmvbLEWDTBe6sYJZxQplC1YKAGmFZQIrLetKqoJzXnKRCy41A8XUsuYn5HKb-1U5W7mVWfspuHTRrDEaZAAlyBT0L0zffU4YR9O3scauqxz6KRqppNKSsSQUW2EdfIwBrRlC21fh2-RgNvTN6waz2WA2oM0vfaOS72J3YFr22Py7duj5D4BvgcI</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>67678622</pqid></control><display><type>article</type><title>Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering</title><source>MEDLINE</source><source>Access via ScienceDirect (Elsevier)</source><source>Alma/SFX Local Collection</source><creator>Zhang, Can ; Ding, Wanyu ; Wang, Hualin ; Chai, Weiping ; Ju, Dongying</creator><creatorcontrib>Zhang, Can ; Ding, Wanyu ; Wang, Hualin ; Chai, Weiping ; Ju, Dongying</creatorcontrib><description>TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system. The crystalline structures, morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and ultraviolet spectrophotometer, respectively. The results indicated that working pressure was the key deposition parameter influencing the TiO2 film phase composition at room temperature, which directly affected its photocatalytic activity. With increasing working pressure, the target self-bias decreases monotonously. Therefore, low temperature TiO2 phase (anatase) could be deposited with high working pressure. The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution, which the degradation rate reached the maximum (35%) after irradiation by ultraviolet light for 1 h.</description><identifier>ISSN: 1001-0742</identifier><identifier>DOI: 10.1016/s1001-0742(08)62334-7</identifier><identifier>PMID: 19803076</identifier><language>eng</language><publisher>Netherlands: School of Materials Science and Engineering,Dalian Jiaotong University,Dalian,116028,China%Department of Material Science and Engineering,Saitama Institute of Technology,Fukaya,369-0293,Japan</publisher><subject>Azo Compounds - chemistry ; Electrochemical Techniques ; Indicators and Reagents - chemistry ; Microscopy, Atomic Force ; Pressure ; Temperature ; Titanium - chemistry ; X-Ray Diffraction</subject><ispartof>Journal of environmental sciences (China), 2009, Vol.21 (6), p.741-744</ispartof><rights>Copyright © Wanfang Data Co. Ltd. All Rights Reserved.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c456t-f6988fdb5de2848df52f7247f4295006f5f25ea86ca6743339351536820727bc3</citedby><cites>FETCH-LOGICAL-c456t-f6988fdb5de2848df52f7247f4295006f5f25ea86ca6743339351536820727bc3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttp://www.wanfangdata.com.cn/images/PeriodicalImages/jes-e/jes-e.jpg</thumbnail><link.rule.ids>314,780,784,4024,27923,27924,27925</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/19803076$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Zhang, Can</creatorcontrib><creatorcontrib>Ding, Wanyu</creatorcontrib><creatorcontrib>Wang, Hualin</creatorcontrib><creatorcontrib>Chai, Weiping</creatorcontrib><creatorcontrib>Ju, Dongying</creatorcontrib><title>Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering</title><title>Journal of environmental sciences (China)</title><addtitle>J Environ Sci (China)</addtitle><description>TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system. The crystalline structures, morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and ultraviolet spectrophotometer, respectively. The results indicated that working pressure was the key deposition parameter influencing the TiO2 film phase composition at room temperature, which directly affected its photocatalytic activity. With increasing working pressure, the target self-bias decreases monotonously. Therefore, low temperature TiO2 phase (anatase) could be deposited with high working pressure. The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution, which the degradation rate reached the maximum (35%) after irradiation by ultraviolet light for 1 h.</description><subject>Azo Compounds - chemistry</subject><subject>Electrochemical Techniques</subject><subject>Indicators and Reagents - chemistry</subject><subject>Microscopy, Atomic Force</subject><subject>Pressure</subject><subject>Temperature</subject><subject>Titanium - chemistry</subject><subject>X-Ray Diffraction</subject><issn>1001-0742</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><sourceid>EIF</sourceid><recordid>eNpFkMtOwzAQRb0A8f4EkFcIFoGJHT-yROUpVeoCWFtpMq5SEjvYiRB_j0srWM1o5t47mkPIeQ43OeTyNuYAeQaqYFegryXjvMjUHjn6Gx-S4xjXAFAIEAfkMC81cFDyiNgXZ7sJXY2Reku_fPho3YoOAWOcAlLvUu8HDGObFNYH-tYuGLVt10fa4OBjO2JDl9_0fkaHqYtI-2rlcAzJGYdpHDGkwFOyb6u0PNvVE_L--PA2e87mi6eX2d08qwshx8zKUmvbLEWDTBe6sYJZxQplC1YKAGmFZQIrLetKqoJzXnKRCy41A8XUsuYn5HKb-1U5W7mVWfspuHTRrDEaZAAlyBT0L0zffU4YR9O3scauqxz6KRqppNKSsSQUW2EdfIwBrRlC21fh2-RgNvTN6waz2WA2oM0vfaOS72J3YFr22Py7duj5D4BvgcI</recordid><startdate>2009</startdate><enddate>2009</enddate><creator>Zhang, Can</creator><creator>Ding, Wanyu</creator><creator>Wang, Hualin</creator><creator>Chai, Weiping</creator><creator>Ju, Dongying</creator><general>School of Materials Science and Engineering,Dalian Jiaotong University,Dalian,116028,China%Department of Material Science and Engineering,Saitama Institute of Technology,Fukaya,369-0293,Japan</general><general>Institute of Optoelectronic Materials and Device,Dalian Jiaotong University,Dalian,116028,China</general><scope>CGR</scope><scope>CUY</scope><scope>CVF</scope><scope>ECM</scope><scope>EIF</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>2B.</scope><scope>4A8</scope><scope>92I</scope><scope>93N</scope><scope>PSX</scope><scope>TCJ</scope></search><sort><creationdate>2009</creationdate><title>Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering</title><author>Zhang, Can ; Ding, Wanyu ; Wang, Hualin ; Chai, Weiping ; Ju, Dongying</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c456t-f6988fdb5de2848df52f7247f4295006f5f25ea86ca6743339351536820727bc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Azo Compounds - chemistry</topic><topic>Electrochemical Techniques</topic><topic>Indicators and Reagents - chemistry</topic><topic>Microscopy, Atomic Force</topic><topic>Pressure</topic><topic>Temperature</topic><topic>Titanium - chemistry</topic><topic>X-Ray Diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zhang, Can</creatorcontrib><creatorcontrib>Ding, Wanyu</creatorcontrib><creatorcontrib>Wang, Hualin</creatorcontrib><creatorcontrib>Chai, Weiping</creatorcontrib><creatorcontrib>Ju, Dongying</creatorcontrib><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Wanfang Data Journals - Hong Kong</collection><collection>WANFANG Data Centre</collection><collection>Wanfang Data Journals</collection><collection>万方数据期刊 - 香港版</collection><collection>China Online Journals (COJ)</collection><collection>China Online Journals (COJ)</collection><jtitle>Journal of environmental sciences (China)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Zhang, Can</au><au>Ding, Wanyu</au><au>Wang, Hualin</au><au>Chai, Weiping</au><au>Ju, Dongying</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering</atitle><jtitle>Journal of environmental sciences (China)</jtitle><addtitle>J Environ Sci (China)</addtitle><date>2009</date><risdate>2009</risdate><volume>21</volume><issue>6</issue><spage>741</spage><epage>744</epage><pages>741-744</pages><issn>1001-0742</issn><abstract>TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system. The crystalline structures, morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and ultraviolet spectrophotometer, respectively. The results indicated that working pressure was the key deposition parameter influencing the TiO2 film phase composition at room temperature, which directly affected its photocatalytic activity. With increasing working pressure, the target self-bias decreases monotonously. Therefore, low temperature TiO2 phase (anatase) could be deposited with high working pressure. The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution, which the degradation rate reached the maximum (35%) after irradiation by ultraviolet light for 1 h.</abstract><cop>Netherlands</cop><pub>School of Materials Science and Engineering,Dalian Jiaotong University,Dalian,116028,China%Department of Material Science and Engineering,Saitama Institute of Technology,Fukaya,369-0293,Japan</pub><pmid>19803076</pmid><doi>10.1016/s1001-0742(08)62334-7</doi><tpages>4</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1001-0742 |
| ispartof | Journal of environmental sciences (China), 2009, Vol.21 (6), p.741-744 |
| issn | 1001-0742 |
| language | eng |
| recordid | cdi_wanfang_journals_jes_e200906006 |
| source | MEDLINE; Access via ScienceDirect (Elsevier); Alma/SFX Local Collection |
| subjects | Azo Compounds - chemistry Electrochemical Techniques Indicators and Reagents - chemistry Microscopy, Atomic Force Pressure Temperature Titanium - chemistry X-Ray Diffraction |
| title | Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T21%3A09%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-wanfang_jour_proqu&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Influences%20of%20working%20pressure%20on%20properties%20for%20TiO2%20films%20deposited%20by%20DC%20pulse%20magnetron%20sputtering&rft.jtitle=Journal%20of%20environmental%20sciences%20(China)&rft.au=Zhang,%20Can&rft.date=2009&rft.volume=21&rft.issue=6&rft.spage=741&rft.epage=744&rft.pages=741-744&rft.issn=1001-0742&rft_id=info:doi/10.1016/s1001-0742(08)62334-7&rft_dat=%3Cwanfang_jour_proqu%3Ejes_e200906006%3C/wanfang_jour_proqu%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=67678622&rft_id=info:pmid/19803076&rft_wanfj_id=jes_e200906006&rfr_iscdi=true |