Process flow with pre-biased mask and wet etching for smooth sidewalls in silicon nitride waveguides
Aspects of the present disclosure are directed to process flow to fabricate a waveguide structure with a silicon nitride core having atomic-level smooth sidewalls achieved by wet etching instead of the conventional dry etching process. A mask is pre-biased to account for lateral etching during the w...
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creator | Anello Photonics, Inc |
description | Aspects of the present disclosure are directed to process flow to fabricate a waveguide structure with a silicon nitride core having atomic-level smooth sidewalls achieved by wet etching instead of the conventional dry etching process. A mask is pre-biased to account for lateral etching during the wet-etching steps. |
format | Patent |
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title | Process flow with pre-biased mask and wet etching for smooth sidewalls in silicon nitride waveguides |
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