Plasma processing apparatus and electronic device manufacturing method

A plasma processing apparatus includes a chamber, substrate stage, electrode, conductive members, and deposition shield. The chamber is maintained at a predetermined potential. The substrate stage serves to hold a substrate within the chamber. The electrode serves to generate a plasma inside the cha...

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Bibliographische Detailangaben

Hauptverfasser:	Tanaka, Yoh, Konaga, Kazuya, Watanabe, Eisaku, Morimoto, Eitaro
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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