Self-service creation and deployment of a pattern solution

Embodiments of the present invention address deficiencies of the art in respect to pattern design and provide a novel and non-obvious method, system and computer program product for self-service creation and deployment of a pattern. In an embodiment of the invention, a method for creating a self-ser...

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Bibliographische Detailangaben

Hauptverfasser:	Beaton, Murray J, Lau, Christina, Rowe, Jr, Billy R
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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