Method and apparatus for growing high purity 2H-silicon carbide

The disclosure relates to a high purity 2H-SiC composition and methods for making same. The embodiments represented herein apply to both thin film and bulk growth of 2H-SiC. According to one embodiment, the disclosure relates to doping an underlying substrate or support layer with one or more surfac...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Singh, Narsingh B, McLaughlin, Sean R, Knight, Thomas J, Young, Robert M, Wagner, Brian P, Kahler, David A, Berghmans, Andre E, Knuteson, David J, McNutt, Ty R, Hedrick, Jr, Jerry W, Bates, George M, Petrosky, Kenneth
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Singh, Narsingh B
McLaughlin, Sean R
Knight, Thomas J
Young, Robert M
Wagner, Brian P
Kahler, David A
Berghmans, Andre E
Knuteson, David J
McNutt, Ty R
Hedrick, Jr, Jerry W
Bates, George M
Petrosky, Kenneth
description The disclosure relates to a high purity 2H-SiC composition and methods for making same. The embodiments represented herein apply to both thin film and bulk growth of 2H-SiC. According to one embodiment, the disclosure relates to doping an underlying substrate or support layer with one or more surfactants to nucleate and grow high purity 2H-SiC. In another embodiment, the disclosure relates to a method for preparing 2H-SiC compositions by nucleating 2H-SiC on another SiC polytype using one or more surfactants. The surfactants can include AlN, Te, Sb and similar compositions. These nucleate SiC into disc form which changes to hexagonal 2H-SiC material.
format Patent
fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_08278666</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>08278666</sourcerecordid><originalsourceid>FETCH-uspatents_grants_082786663</originalsourceid><addsrcrecordid>eNrjZLD3TS3JyE9RSMwD4oKCxKLEktJihbT8IoX0ovzyzLx0hYzM9AyFgtKizJJKBSMP3eLMnMzk_DyF5MSipMyUVB4G1rTEnOJUXijNzaDg5hri7KFbWlyQWJKaV1Icn16UCKIMLIzMLczMzIyJUAIAMIoxgg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and apparatus for growing high purity 2H-silicon carbide</title><source>USPTO Issued Patents</source><creator>Singh, Narsingh B ; McLaughlin, Sean R ; Knight, Thomas J ; Young, Robert M ; Wagner, Brian P ; Kahler, David A ; Berghmans, Andre E ; Knuteson, David J ; McNutt, Ty R ; Hedrick, Jr, Jerry W ; Bates, George M ; Petrosky, Kenneth</creator><creatorcontrib>Singh, Narsingh B ; McLaughlin, Sean R ; Knight, Thomas J ; Young, Robert M ; Wagner, Brian P ; Kahler, David A ; Berghmans, Andre E ; Knuteson, David J ; McNutt, Ty R ; Hedrick, Jr, Jerry W ; Bates, George M ; Petrosky, Kenneth ; Northrop Grumman Systems Corporation</creatorcontrib><description>The disclosure relates to a high purity 2H-SiC composition and methods for making same. The embodiments represented herein apply to both thin film and bulk growth of 2H-SiC. According to one embodiment, the disclosure relates to doping an underlying substrate or support layer with one or more surfactants to nucleate and grow high purity 2H-SiC. In another embodiment, the disclosure relates to a method for preparing 2H-SiC compositions by nucleating 2H-SiC on another SiC polytype using one or more surfactants. The surfactants can include AlN, Te, Sb and similar compositions. These nucleate SiC into disc form which changes to hexagonal 2H-SiC material.</description><language>eng</language><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8278666$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64015</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8278666$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Singh, Narsingh B</creatorcontrib><creatorcontrib>McLaughlin, Sean R</creatorcontrib><creatorcontrib>Knight, Thomas J</creatorcontrib><creatorcontrib>Young, Robert M</creatorcontrib><creatorcontrib>Wagner, Brian P</creatorcontrib><creatorcontrib>Kahler, David A</creatorcontrib><creatorcontrib>Berghmans, Andre E</creatorcontrib><creatorcontrib>Knuteson, David J</creatorcontrib><creatorcontrib>McNutt, Ty R</creatorcontrib><creatorcontrib>Hedrick, Jr, Jerry W</creatorcontrib><creatorcontrib>Bates, George M</creatorcontrib><creatorcontrib>Petrosky, Kenneth</creatorcontrib><creatorcontrib>Northrop Grumman Systems Corporation</creatorcontrib><title>Method and apparatus for growing high purity 2H-silicon carbide</title><description>The disclosure relates to a high purity 2H-SiC composition and methods for making same. The embodiments represented herein apply to both thin film and bulk growth of 2H-SiC. According to one embodiment, the disclosure relates to doping an underlying substrate or support layer with one or more surfactants to nucleate and grow high purity 2H-SiC. In another embodiment, the disclosure relates to a method for preparing 2H-SiC compositions by nucleating 2H-SiC on another SiC polytype using one or more surfactants. The surfactants can include AlN, Te, Sb and similar compositions. These nucleate SiC into disc form which changes to hexagonal 2H-SiC material.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZLD3TS3JyE9RSMwD4oKCxKLEktJihbT8IoX0ovzyzLx0hYzM9AyFgtKizJJKBSMP3eLMnMzk_DyF5MSipMyUVB4G1rTEnOJUXijNzaDg5hri7KFbWlyQWJKaV1Icn16UCKIMLIzMLczMzIyJUAIAMIoxgg</recordid><startdate>20121002</startdate><enddate>20121002</enddate><creator>Singh, Narsingh B</creator><creator>McLaughlin, Sean R</creator><creator>Knight, Thomas J</creator><creator>Young, Robert M</creator><creator>Wagner, Brian P</creator><creator>Kahler, David A</creator><creator>Berghmans, Andre E</creator><creator>Knuteson, David J</creator><creator>McNutt, Ty R</creator><creator>Hedrick, Jr, Jerry W</creator><creator>Bates, George M</creator><creator>Petrosky, Kenneth</creator><scope>EFH</scope></search><sort><creationdate>20121002</creationdate><title>Method and apparatus for growing high purity 2H-silicon carbide</title><author>Singh, Narsingh B ; McLaughlin, Sean R ; Knight, Thomas J ; Young, Robert M ; Wagner, Brian P ; Kahler, David A ; Berghmans, Andre E ; Knuteson, David J ; McNutt, Ty R ; Hedrick, Jr, Jerry W ; Bates, George M ; Petrosky, Kenneth</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_082786663</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Singh, Narsingh B</creatorcontrib><creatorcontrib>McLaughlin, Sean R</creatorcontrib><creatorcontrib>Knight, Thomas J</creatorcontrib><creatorcontrib>Young, Robert M</creatorcontrib><creatorcontrib>Wagner, Brian P</creatorcontrib><creatorcontrib>Kahler, David A</creatorcontrib><creatorcontrib>Berghmans, Andre E</creatorcontrib><creatorcontrib>Knuteson, David J</creatorcontrib><creatorcontrib>McNutt, Ty R</creatorcontrib><creatorcontrib>Hedrick, Jr, Jerry W</creatorcontrib><creatorcontrib>Bates, George M</creatorcontrib><creatorcontrib>Petrosky, Kenneth</creatorcontrib><creatorcontrib>Northrop Grumman Systems Corporation</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Singh, Narsingh B</au><au>McLaughlin, Sean R</au><au>Knight, Thomas J</au><au>Young, Robert M</au><au>Wagner, Brian P</au><au>Kahler, David A</au><au>Berghmans, Andre E</au><au>Knuteson, David J</au><au>McNutt, Ty R</au><au>Hedrick, Jr, Jerry W</au><au>Bates, George M</au><au>Petrosky, Kenneth</au><aucorp>Northrop Grumman Systems Corporation</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and apparatus for growing high purity 2H-silicon carbide</title><date>2012-10-02</date><risdate>2012</risdate><abstract>The disclosure relates to a high purity 2H-SiC composition and methods for making same. The embodiments represented herein apply to both thin film and bulk growth of 2H-SiC. According to one embodiment, the disclosure relates to doping an underlying substrate or support layer with one or more surfactants to nucleate and grow high purity 2H-SiC. In another embodiment, the disclosure relates to a method for preparing 2H-SiC compositions by nucleating 2H-SiC on another SiC polytype using one or more surfactants. The surfactants can include AlN, Te, Sb and similar compositions. These nucleate SiC into disc form which changes to hexagonal 2H-SiC material.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_uspatents_grants_08278666
source USPTO Issued Patents
title Method and apparatus for growing high purity 2H-silicon carbide
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T02%3A38%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Singh,%20Narsingh%20B&rft.aucorp=Northrop%20Grumman%20Systems%20Corporation&rft.date=2012-10-02&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E08278666%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true