Semiconductor structures and methods of manufacturing the same

A semiconductor structure has embedded stressor material for enhanced transistor performance. The method of forming the semiconductor structure includes etching an undercut in a substrate material under one or more gate structures while protecting an implant with a liner material. The method further...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Li, Xi, Ontalus, Viorel C
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
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