Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer

Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer

An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.

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Hauptverfasser: Yoon, Kyong Ho, Kim, Jong Seob, Uh, Dong Seon, Oh, Chang Il, Hyung, Kyung Hee, Kim, Min Soo, Lee, Jin Kuk
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Sprache:eng
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creator Yoon, Kyong Ho
Kim, Jong Seob
Uh, Dong Seon
Oh, Chang Il
Hyung, Kyung Hee
Kim, Min Soo
Lee, Jin Kuk
description An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
format Patent
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title Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
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