Self-releasing resist material for nano-imprint processes

Nanoimprint lithography using resist material with the addition of a surfactant is described. A template release layer is formed on a pattern of a template. A non-ionic surfactant is added to a resist material to form a mixed resist material. The resist material may comprise a hydrocarbon material h...

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Bibliographische Detailangaben

Hauptverfasser:	Best, Margaret E, Guo, Xing-Cai, Karis, Thomas E, Kercher, Dan S, Mate, Charles M, Wu, Tsai-Wei
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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