Pattern shape inspection method and apparatus thereof

This invention relates to a pattern shape inspection method and an apparatus thereof for conducting a first step of irradiating wideband illuminating light which contains far ultraviolet light to a sample from a perpendicular direction, inspecting a shape of the pattern based on a spectral waveform...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Saito, Keiya, Sasazawa, Hideaki, Hirose, Takenori
Format: Patent
Sprache:eng
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