Radiation source
A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a r...
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| creator | Banine, Vadim Yevgenyevich Ivanov, Vladimir Vitalevich |
| description | A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with the substance at the interaction point, and a conduit constructed and arranged to deliver unheated buffer gas into the chamber at a location adjacent to the interaction point at a rate that removes heated buffer gas from a region around the interaction point before a subsequent interaction between the laser beam and the substance at the interaction point. |
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| fullrecord | <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_08242473</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>08242473</sourcerecordid><originalsourceid>FETCH-uspatents_grants_082424733</originalsourceid><addsrcrecordid>eNrjZBAISkzJTCzJzM9TKM4vLUpO5WFgTUvMKU7lhdLcDApuriHOHrqlxQWJJal5JcXx6UWJIMrAwsjEyMTc2JgIJQCcIiAt</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Radiation source</title><source>USPTO Issued Patents</source><creator>Banine, Vadim Yevgenyevich ; Ivanov, Vladimir Vitalevich</creator><creatorcontrib>Banine, Vadim Yevgenyevich ; Ivanov, Vladimir Vitalevich ; ASML Netherlands B.V</creatorcontrib><description>A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with the substance at the interaction point, and a conduit constructed and arranged to deliver unheated buffer gas into the chamber at a location adjacent to the interaction point at a rate that removes heated buffer gas from a region around the interaction point before a subsequent interaction between the laser beam and the substance at the interaction point.</description><language>eng</language><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8242473$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8242473$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Banine, Vadim Yevgenyevich</creatorcontrib><creatorcontrib>Ivanov, Vladimir Vitalevich</creatorcontrib><creatorcontrib>ASML Netherlands B.V</creatorcontrib><title>Radiation source</title><description>A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with the substance at the interaction point, and a conduit constructed and arranged to deliver unheated buffer gas into the chamber at a location adjacent to the interaction point at a rate that removes heated buffer gas from a region around the interaction point before a subsequent interaction between the laser beam and the substance at the interaction point.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZBAISkzJTCzJzM9TKM4vLUpO5WFgTUvMKU7lhdLcDApuriHOHrqlxQWJJal5JcXx6UWJIMrAwsjEyMTc2JgIJQCcIiAt</recordid><startdate>20120814</startdate><enddate>20120814</enddate><creator>Banine, Vadim Yevgenyevich</creator><creator>Ivanov, Vladimir Vitalevich</creator><scope>EFH</scope></search><sort><creationdate>20120814</creationdate><title>Radiation source</title><author>Banine, Vadim Yevgenyevich ; Ivanov, Vladimir Vitalevich</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_082424733</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Banine, Vadim Yevgenyevich</creatorcontrib><creatorcontrib>Ivanov, Vladimir Vitalevich</creatorcontrib><creatorcontrib>ASML Netherlands B.V</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Banine, Vadim Yevgenyevich</au><au>Ivanov, Vladimir Vitalevich</au><aucorp>ASML Netherlands B.V</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Radiation source</title><date>2012-08-14</date><risdate>2012</risdate><abstract>A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with the substance at the interaction point, and a conduit constructed and arranged to deliver unheated buffer gas into the chamber at a location adjacent to the interaction point at a rate that removes heated buffer gas from a region around the interaction point before a subsequent interaction between the laser beam and the substance at the interaction point.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| source | USPTO Issued Patents |
| title | Radiation source |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T14%3A22%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Banine,%20Vadim%20Yevgenyevich&rft.aucorp=ASML%20Netherlands%20B.V&rft.date=2012-08-14&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E08242473%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |