Pattern inspection apparatus, corrected image generation method, and computer-readable recording medium storing program

A pattern inspection apparatus includes a first unit configured to acquire an optical image of a target workpiece to be inspected, a second unit configured to generate a reference image to be compared, a third unit configured, by using a mathematical model in which a parallel shift amount, an expans...

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Bibliographische Detailangaben
1. Verfasser: Yamashita, Kyoji
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
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