Semiconductor inter-field dose correction

A method and apparatus are provided for adapting a semiconductor inter-field dose correction map from a first photolithography mask to a second photolithography mask using the same manufacturing stack and reactive ion etching processes, the method including: obtaining a first dose correction map for...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Lee, Hyung-Rae, Yu, Dong hee, Tsou, Len Y, Zhuang, Haoren
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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