Method and apparatus for reviewing defects on mask

A defect to be reviewed is selected from a plurality of defects obtained from inspection results. When the selected defect is a defect of a pattern written using an iteration expression in design data on the mask, another pattern written using the iteration expression in the design data is extracted...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Inoue, Takafumi, Sugino, Masanori
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!