Monitor for variation of critical dimensions (CDs) of reticles

The present invention provides a reticle for use in a lithographic process. The reticle, in one embodiment, includes a patterned layer located over a reticle substrate. The reticle may further include a test pattern located over the reticle substrate, wherein a portion of the test pattern is within...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Hong, Hyesook, Ma, Zhiliu, Wright, John K
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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