Anti-reflection plate and method for manufacturing anti-reflection structure thereof

Anti-reflection plate and method for manufacturing anti-reflection structure thereof

A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressur...

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Hauptverfasser: Chen, Chih-Wei, Wu, Chin-Jyi, Hsieh, Wen-Tzong, Hsu, Wen-Tung, Lin, Chun-Hung
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Sprache:eng
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creator Chen, Chih-Wei
Wu, Chin-Jyi
Hsieh, Wen-Tzong
Hsu, Wen-Tung
Lin, Chun-Hung
description A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.
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fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_08158211</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>08158211</sourcerecordid><originalsourceid>FETCH-uspatents_grants_081582113</originalsourceid><addsrcrecordid>eNrjZAhxzCvJ1C1KTctJTS7JzM9TKMhJLElVSMxLUchNLcnIT1FIyy9SyE3MK01LTC4pLcrMSwdKomopLikqBcmlKpRkpBal5qfxMLCmJeYUp_JCaW4GBTfXEGcP3dLiAqDpeSXF8elFiSDKwMLQ1MLI0NCYCCUAn006aA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Anti-reflection plate and method for manufacturing anti-reflection structure thereof</title><source>USPTO Issued Patents</source><creator>Chen, Chih-Wei ; Wu, Chin-Jyi ; Hsieh, Wen-Tzong ; Hsu, Wen-Tung ; Lin, Chun-Hung</creator><creatorcontrib>Chen, Chih-Wei ; Wu, Chin-Jyi ; Hsieh, Wen-Tzong ; Hsu, Wen-Tung ; Lin, Chun-Hung ; Industrial Technology Research Institute</creatorcontrib><description>A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.</description><language>eng</language><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8158211$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64012</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8158211$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Chen, Chih-Wei</creatorcontrib><creatorcontrib>Wu, Chin-Jyi</creatorcontrib><creatorcontrib>Hsieh, Wen-Tzong</creatorcontrib><creatorcontrib>Hsu, Wen-Tung</creatorcontrib><creatorcontrib>Lin, Chun-Hung</creatorcontrib><creatorcontrib>Industrial Technology Research Institute</creatorcontrib><title>Anti-reflection plate and method for manufacturing anti-reflection structure thereof</title><description>A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZAhxzCvJ1C1KTctJTS7JzM9TKMhJLElVSMxLUchNLcnIT1FIyy9SyE3MK01LTC4pLcrMSwdKomopLikqBcmlKpRkpBal5qfxMLCmJeYUp_JCaW4GBTfXEGcP3dLiAqDpeSXF8elFiSDKwMLQ1MLI0NCYCCUAn006aA</recordid><startdate>20120417</startdate><enddate>20120417</enddate><creator>Chen, Chih-Wei</creator><creator>Wu, Chin-Jyi</creator><creator>Hsieh, Wen-Tzong</creator><creator>Hsu, Wen-Tung</creator><creator>Lin, Chun-Hung</creator><scope>EFH</scope></search><sort><creationdate>20120417</creationdate><title>Anti-reflection plate and method for manufacturing anti-reflection structure thereof</title><author>Chen, Chih-Wei ; Wu, Chin-Jyi ; Hsieh, Wen-Tzong ; Hsu, Wen-Tung ; Lin, Chun-Hung</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_081582113</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Chen, Chih-Wei</creatorcontrib><creatorcontrib>Wu, Chin-Jyi</creatorcontrib><creatorcontrib>Hsieh, Wen-Tzong</creatorcontrib><creatorcontrib>Hsu, Wen-Tung</creatorcontrib><creatorcontrib>Lin, Chun-Hung</creatorcontrib><creatorcontrib>Industrial Technology Research Institute</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Chen, Chih-Wei</au><au>Wu, Chin-Jyi</au><au>Hsieh, Wen-Tzong</au><au>Hsu, Wen-Tung</au><au>Lin, Chun-Hung</au><aucorp>Industrial Technology Research Institute</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Anti-reflection plate and method for manufacturing anti-reflection structure thereof</title><date>2012-04-17</date><risdate>2012</risdate><abstract>A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.</abstract><oa>free_for_read</oa></addata></record>
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title Anti-reflection plate and method for manufacturing anti-reflection structure thereof
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-31T14%3A49%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Chen,%20Chih-Wei&rft.aucorp=Industrial%20Technology%20Research%20Institute&rft.date=2012-04-17&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E08158211%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true