Alignment systems and methods for lithographic systems

An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to proces...

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Hauptverfasser:	Van Bilsen, Franciscus Bernardus Maria, Burghoorn, Jacobus, Van Haren, Richard Johannes Franciscus, Hinnen, Paul Christiaan, Van Horssen, Hermanus Gerardus, Huijbregtse, Jeroen, Jeunink, Andre Bernardus, Megens, Henry, Koren, Ramon Navarro Y, Tolsma, Hoite Pieter Theodoor, Simons, Hubertus Johannes Gertrudus, Schuurhuis, Johny Rutger, Schets, Sicco Ian, Lee, Brian Young Bok, Dunbar, Allan Reuben
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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