Alignment systems and methods for lithographic systems
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to proces...
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| creator | Van Bilsen, Franciscus Bernardus Maria Burghoorn, Jacobus Van Haren, Richard Johannes Franciscus Hinnen, Paul Christiaan Van Horssen, Hermanus Gerardus Huijbregtse, Jeroen Jeunink, Andre Bernardus Megens, Henry Koren, Ramon Navarro Y Tolsma, Hoite Pieter Theodoor Simons, Hubertus Johannes Gertrudus Schuurhuis, Johny Rutger Schets, Sicco Ian Lee, Brian Young Bok Dunbar, Allan Reuben |
| description | An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively. |
| format | Patent |
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The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.</abstract><oa>free_for_read</oa></addata></record> |
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| title | Alignment systems and methods for lithographic systems |
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