Illumination system of a microlithographic exposure apparatus

An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, aro...

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Bibliographische Detailangaben

Hauptverfasser:	Singer, Wolfgang, Wangler, Johannes, Egger, Rafael, Ulrich, Wilhelm
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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