Controlled plasma power supply
A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverte...
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| creator | Nitschke, Moritz |
| description | A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter. |
| format | Patent |
| fullrecord | <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_08110992</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>08110992</sourcerecordid><originalsourceid>FETCH-uspatents_grants_081109923</originalsourceid><addsrcrecordid>eNrjZJBzzs8rKcrPyUlNUSjISSzOTVQoyC9PLVIoLi0oyKnkYWBNS8wpTuWF0twMCm6uIc4euqXFBYklqXklxfHpRYkgysDC0NDA0tLImAglAP4xJb0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Controlled plasma power supply</title><source>USPTO Issued Patents</source><creator>Nitschke, Moritz</creator><creatorcontrib>Nitschke, Moritz ; HUETTINGER Elektronik GmbH + Co. KG</creatorcontrib><description>A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.</description><language>eng</language><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8110992$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8110992$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Nitschke, Moritz</creatorcontrib><creatorcontrib>HUETTINGER Elektronik GmbH + Co. KG</creatorcontrib><title>Controlled plasma power supply</title><description>A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZJBzzs8rKcrPyUlNUSjISSzOTVQoyC9PLVIoLi0oyKnkYWBNS8wpTuWF0twMCm6uIc4euqXFBYklqXklxfHpRYkgysDC0NDA0tLImAglAP4xJb0</recordid><startdate>20120207</startdate><enddate>20120207</enddate><creator>Nitschke, Moritz</creator><scope>EFH</scope></search><sort><creationdate>20120207</creationdate><title>Controlled plasma power supply</title><author>Nitschke, Moritz</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_081109923</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Nitschke, Moritz</creatorcontrib><creatorcontrib>HUETTINGER Elektronik GmbH + Co. KG</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Nitschke, Moritz</au><aucorp>HUETTINGER Elektronik GmbH + Co. KG</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Controlled plasma power supply</title><date>2012-02-07</date><risdate>2012</risdate><abstract>A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
| recordid | cdi_uspatents_grants_08110992 |
| source | USPTO Issued Patents |
| title | Controlled plasma power supply |
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