Apparatus for particle removal by single-phase and two-phase media

The embodiments of the present invention provide apparatus for cleaning patterned substrates with fine features with cleaning materials. The apparatus using the cleaning materials has advantages in cleaning patterned substrates with fine features without substantially damaging the features. The clea...

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Bibliographische Detailangaben

Hauptverfasser:	Mui, David S. L, Srinivasan, Satish, Peng, Grant, Zhu, Ji, Kon, Shih-Chung, Podlesnik, Dragan, Mendiratta, Arjun
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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