Plasma processing apparatus and method

A plasma processing apparatus includes in a processing chamber, a sample stage, a bell jar, a coil antenna, a Faraday shield, and a gas ring member located below a skirt portion of the bell jar and above the sample stage. The gas ring member supplies a process gas to a plasma generating space inside...

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Bibliographische Detailangaben

Hauptverfasser:	Nishio, Ryoji, Yoshioka, Ken, Kanai, Saburou, Kanekiyo, Tadamitsu, Kihara, Hideki, Okuda, Koji
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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