Exposure method and exposure device

An exposure method capable of performing accurate exposure without using a large photomask. The exposure method performs exposure while relatively moving a photomask above a substrate and includes a step of performing position correction of the photomask by performing, on a front side of the photoma...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Ogata, Shouichi, Fuse, Daisuke, Minami, Yasuo
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
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