Projection objective and method for optimizing a system aperture stop of a projection objective

In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refract...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Schuster, Karl-Heinz
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!