Film bonding method, film bonding apparatus, and semiconductor device manufacturing method

A film bonding method of bonding a die bond film without causing any breakage. The die bond film is pressed against a wafer having a surface protective tape bonded thereto using a film-setting roller and a film-bonding roller, and a laser beam having a predetermined shape is irradiated to an area be...

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Hauptverfasser: Shinjo, Yoshiaki, Shimobeppu, Yuzo, Teshirogi, Kazuo, Yoshimoto, Kazuhiro
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Sprache:eng
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creator Shinjo, Yoshiaki
Shimobeppu, Yuzo
Teshirogi, Kazuo
Yoshimoto, Kazuhiro
description A film bonding method of bonding a die bond film without causing any breakage. The die bond film is pressed against a wafer having a surface protective tape bonded thereto using a film-setting roller and a film-bonding roller, and a laser beam having a predetermined shape is irradiated to an area between the rollers. While rotationally moving the film-setting roller and the film-bonding roller, the laser beam is scanned on the wafer in accordance with their motion, and a portion of the die bond film, melted by the laser beam, is pressed against the wafer by the film-bonding roller following the film-setting roller to bond the die bond film to the wafer. Since the die bond film is bonded to the wafer by melting the same by the laser beam, even if the wafer is thin and reduced in its strength, it is possible to avoid the wafer from being damaged e.g. by thermal contraction of the surface protective tape.
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title Film bonding method, film bonding apparatus, and semiconductor device manufacturing method
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