Method and apparatus for controlling beam current uniformity in an ion implanter

An ion implantation system for neutralizing the space charge effect associated with a high current low energy ion beam. The implantation system includes an ion source configured to receive a dopant gas and generate ions having a particular energy and mass from which ions are extracted through an ape...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Lischer, D. Jeffrey, Koo, John (Bon-Woong), Kurunczi, Peter F, Patel, Shardul, Platow, Wilhelm P
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!