Overlay measurement on double patterning substrate
1 2 A method of measuring overlay between a first structure and a second structure on a substrate is provided. The structures include equidistant elements, such as parallel lines, wherein the equidistant elements of the first and second structure alternate. A design width CDof the elements of the fi...
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| Sprache: | eng |
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| Zusammenfassung: | 1 2 A method of measuring overlay between a first structure and a second structure on a substrate is provided. The structures include equidistant elements, such as parallel lines, wherein the equidistant elements of the first and second structure alternate. A design width CDof the elements of the first structure is different from a design width CDof the elements of the second structure. The difference in design width can be used to identify measurement points having incorrectly measured overlay errors. |
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