Projection objective of a microlithographic projection exposure apparatus

A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled wi...

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Bibliographische Detailangaben

Hauptverfasser:	Conradi, Olaf, Bittner, Boris, Bleidistel, Sascha, Hauf, Markus, Hummel, Wolfgang, Kazi, Arif, Schwaer, Baerbel, Weber, Jochen, Holderer, Hubert, Tayebati, Payam
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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