Method and apparatus for measurement and control of photomask to substrate alignment

Method and apparatus for measurement and control of photomask to substrate alignment

A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirr...

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Hauptverfasser: Granados, Axel A, Fox, Benjamin A, Gibbs, Nathaniel J, Maki, Andrew B, Timpane, Trevor J
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Sprache:eng
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creator Granados, Axel A
Fox, Benjamin A
Gibbs, Nathaniel J
Maki, Andrew B
Timpane, Trevor J
description A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.
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fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07989968</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07989968</sourcerecordid><originalsourceid>FETCH-uspatents_grants_079899683</originalsourceid><addsrcrecordid>eNqNizEKAjEQRdNYiHqHuYAgCLqpZcXGbnsZdbIrJpkwM7m_WfEAFp9X_PeWbriSTfwEzG2loKBVhcACiVCrUKJs3_fB2YQjcIAysXFCfYMxaL2rtYwA42vMs792i4BRafPjysG5H06XbdXSxGx6GwVn7I6-8_7Q7f9QPosEOmk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and apparatus for measurement and control of photomask to substrate alignment</title><source>USPTO Issued Patents</source><creator>Granados, Axel A ; Fox, Benjamin A ; Gibbs, Nathaniel J ; Maki, Andrew B ; Timpane, Trevor J</creator><creatorcontrib>Granados, Axel A ; Fox, Benjamin A ; Gibbs, Nathaniel J ; Maki, Andrew B ; Timpane, Trevor J ; International Business Machines Corporation</creatorcontrib><description>A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.</description><language>eng</language><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7989968$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7989968$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Granados, Axel A</creatorcontrib><creatorcontrib>Fox, Benjamin A</creatorcontrib><creatorcontrib>Gibbs, Nathaniel J</creatorcontrib><creatorcontrib>Maki, Andrew B</creatorcontrib><creatorcontrib>Timpane, Trevor J</creatorcontrib><creatorcontrib>International Business Machines Corporation</creatorcontrib><title>Method and apparatus for measurement and control of photomask to substrate alignment</title><description>A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNqNizEKAjEQRdNYiHqHuYAgCLqpZcXGbnsZdbIrJpkwM7m_WfEAFp9X_PeWbriSTfwEzG2loKBVhcACiVCrUKJs3_fB2YQjcIAysXFCfYMxaL2rtYwA42vMs792i4BRafPjysG5H06XbdXSxGx6GwVn7I6-8_7Q7f9QPosEOmk</recordid><startdate>20110802</startdate><enddate>20110802</enddate><creator>Granados, Axel A</creator><creator>Fox, Benjamin A</creator><creator>Gibbs, Nathaniel J</creator><creator>Maki, Andrew B</creator><creator>Timpane, Trevor J</creator><scope>EFH</scope></search><sort><creationdate>20110802</creationdate><title>Method and apparatus for measurement and control of photomask to substrate alignment</title><author>Granados, Axel A ; Fox, Benjamin A ; Gibbs, Nathaniel J ; Maki, Andrew B ; Timpane, Trevor J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_079899683</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Granados, Axel A</creatorcontrib><creatorcontrib>Fox, Benjamin A</creatorcontrib><creatorcontrib>Gibbs, Nathaniel J</creatorcontrib><creatorcontrib>Maki, Andrew B</creatorcontrib><creatorcontrib>Timpane, Trevor J</creatorcontrib><creatorcontrib>International Business Machines Corporation</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Granados, Axel A</au><au>Fox, Benjamin A</au><au>Gibbs, Nathaniel J</au><au>Maki, Andrew B</au><au>Timpane, Trevor J</au><aucorp>International Business Machines Corporation</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and apparatus for measurement and control of photomask to substrate alignment</title><date>2011-08-02</date><risdate>2011</risdate><abstract>A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.</abstract><oa>free_for_read</oa></addata></record>
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title Method and apparatus for measurement and control of photomask to substrate alignment
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T13%3A51%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Granados,%20Axel%20A&rft.aucorp=International%20Business%20Machines%20Corporation&rft.date=2011-08-02&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07989968%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true