High-capacitance density thin film dielectrics having columnar grains formed on base-metal foils

Deposited thin-film dielectrics having columnar grains and high dielectric constants are formed on heat treated and polished metal foil. The sputtered dielectrics are annealed at low oxygen partial pressures.

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	Bao, Lijie, Li, Zhigang Rick, Reardon, Damien, Ryley, James F, Palanduz, Cengiz A
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue
container_start_page
container_title
container_volume
creator	Bao, Lijie Li, Zhigang Rick Reardon, Damien Ryley, James F Palanduz, Cengiz A
description	Deposited thin-film dielectrics having columnar grains and high dielectric constants are formed on heat treated and polished metal foil. The sputtered dielectrics are annealed at low oxygen partial pressures.
format	Patent
fullrecord	<record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07981741</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07981741</sourcerecordid><originalsourceid>FETCH-uspatents_grants_079817413</originalsourceid><addsrcrecordid>eNqNjEEKwjAQAHvxIOof9gMBi0L1XJQ-wLuu6aZdSDYluxX8vRV8gKeBYZh19eh4GJ3HCT0biifoSZTtDTayQOCYoGeK5K2wVxjxxTKAz3FOggWGgiwKIZdEPWSBJyq5RIZxkRx1W60CRqXdj5sKrpdb27lZJzQS0_vy-GLfnE91c6wPfyQfg3Q-Ug</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>High-capacitance density thin film dielectrics having columnar grains formed on base-metal foils</title><source>USPTO Issued Patents</source><creator>Bao, Lijie ; Li, Zhigang Rick ; Reardon, Damien ; Ryley, James F ; Palanduz, Cengiz A</creator><creatorcontrib>Bao, Lijie ; Li, Zhigang Rick ; Reardon, Damien ; Ryley, James F ; Palanduz, Cengiz A ; E. I. du Pont de Nemours and Company</creatorcontrib><description>Deposited thin-film dielectrics having columnar grains and high dielectric constants are formed on heat treated and polished metal foil. The sputtered dielectrics are annealed at low oxygen partial pressures.</description><language>eng</language><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7981741$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7981741$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Bao, Lijie</creatorcontrib><creatorcontrib>Li, Zhigang Rick</creatorcontrib><creatorcontrib>Reardon, Damien</creatorcontrib><creatorcontrib>Ryley, James F</creatorcontrib><creatorcontrib>Palanduz, Cengiz A</creatorcontrib><creatorcontrib>E. I. du Pont de Nemours and Company</creatorcontrib><title>High-capacitance density thin film dielectrics having columnar grains formed on base-metal foils</title><description>Deposited thin-film dielectrics having columnar grains and high dielectric constants are formed on heat treated and polished metal foil. The sputtered dielectrics are annealed at low oxygen partial pressures.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNqNjEEKwjAQAHvxIOof9gMBi0L1XJQ-wLuu6aZdSDYluxX8vRV8gKeBYZh19eh4GJ3HCT0biifoSZTtDTayQOCYoGeK5K2wVxjxxTKAz3FOggWGgiwKIZdEPWSBJyq5RIZxkRx1W60CRqXdj5sKrpdb27lZJzQS0_vy-GLfnE91c6wPfyQfg3Q-Ug</recordid><startdate>20110719</startdate><enddate>20110719</enddate><creator>Bao, Lijie</creator><creator>Li, Zhigang Rick</creator><creator>Reardon, Damien</creator><creator>Ryley, James F</creator><creator>Palanduz, Cengiz A</creator><scope>EFH</scope></search><sort><creationdate>20110719</creationdate><title>High-capacitance density thin film dielectrics having columnar grains formed on base-metal foils</title><author>Bao, Lijie ; Li, Zhigang Rick ; Reardon, Damien ; Ryley, James F ; Palanduz, Cengiz A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_079817413</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Bao, Lijie</creatorcontrib><creatorcontrib>Li, Zhigang Rick</creatorcontrib><creatorcontrib>Reardon, Damien</creatorcontrib><creatorcontrib>Ryley, James F</creatorcontrib><creatorcontrib>Palanduz, Cengiz A</creatorcontrib><creatorcontrib>E. I. du Pont de Nemours and Company</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Bao, Lijie</au><au>Li, Zhigang Rick</au><au>Reardon, Damien</au><au>Ryley, James F</au><au>Palanduz, Cengiz A</au><aucorp>E. I. du Pont de Nemours and Company</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>High-capacitance density thin film dielectrics having columnar grains formed on base-metal foils</title><date>2011-07-19</date><risdate>2011</risdate><abstract>Deposited thin-film dielectrics having columnar grains and high dielectric constants are formed on heat treated and polished metal foil. The sputtered dielectrics are annealed at low oxygen partial pressures.</abstract><oa>free_for_read</oa></addata></record>
fulltext	fulltext_linktorsrc
identifier
ispartof
issn
language	eng
recordid	cdi_uspatents_grants_07981741
source	USPTO Issued Patents
title	High-capacitance density thin film dielectrics having columnar grains formed on base-metal foils
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T08%3A48%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Bao,%20Lijie&rft.aucorp=E.%20I.%20du%20Pont%20de%20Nemours%20and%20Company&rft.date=2011-07-19&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07981741%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true