Dual cure compositions employing free radical and RTV cure

Dual cure compositions employing free radical and RTV cure

The present invention relates to dual curing compositions, which cure with moisture and photo radiation, such as UV light, and methods for preparing and using same. In particular, the compositions of the present invention contain a polyether or polyester backbone, photocurable portion(s) and moistur...

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Hauptverfasser: Jacobine, Anthony F, Woods, John G, Nakos, Steven T, Lim, Thomas Fay-Oy
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Sprache:eng
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creator Jacobine, Anthony F
Woods, John G
Nakos, Steven T
Lim, Thomas Fay-Oy
description The present invention relates to dual curing compositions, which cure with moisture and photo radiation, such as UV light, and methods for preparing and using same. In particular, the compositions of the present invention contain a polyether or polyester backbone, photocurable portion(s) and moisture curable portion(s). The photo curable portion is a urethane or carbamate linkage terminated with a (meth)acryloxyalkyl group. The moisture curable portion is either: (1) a portion terminated with a polyalkoxysilyl group; or (2) a portion having a urea linkage terminated with an alkylpolyalkoxysilyl group.
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fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07960445</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07960445</sourcerecordid><originalsourceid>FETCH-uspatents_grants_079604453</originalsourceid><addsrcrecordid>eNrjZLByKU3MUUguLUpVSM7PLcgvzizJzM8rVkjNLcjJr8zMS1dIK0pNVShKTMlMBipMzEtRCAoJA2vgYWBNS8wpTuWF0twMCm6uIc4euqXFBYklqXklxfHpRYkgysDc0szAxMTUmAglACeEL5U</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Dual cure compositions employing free radical and RTV cure</title><source>USPTO Issued Patents</source><creator>Jacobine, Anthony F ; Woods, John G ; Nakos, Steven T ; Lim, Thomas Fay-Oy</creator><creatorcontrib>Jacobine, Anthony F ; Woods, John G ; Nakos, Steven T ; Lim, Thomas Fay-Oy ; Henkel Corporation</creatorcontrib><description>The present invention relates to dual curing compositions, which cure with moisture and photo radiation, such as UV light, and methods for preparing and using same. In particular, the compositions of the present invention contain a polyether or polyester backbone, photocurable portion(s) and moisture curable portion(s). The photo curable portion is a urethane or carbamate linkage terminated with a (meth)acryloxyalkyl group. The moisture curable portion is either: (1) a portion terminated with a polyalkoxysilyl group; or (2) a portion having a urea linkage terminated with an alkylpolyalkoxysilyl group.</description><language>eng</language><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7960445$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7960445$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Jacobine, Anthony F</creatorcontrib><creatorcontrib>Woods, John G</creatorcontrib><creatorcontrib>Nakos, Steven T</creatorcontrib><creatorcontrib>Lim, Thomas Fay-Oy</creatorcontrib><creatorcontrib>Henkel Corporation</creatorcontrib><title>Dual cure compositions employing free radical and RTV cure</title><description>The present invention relates to dual curing compositions, which cure with moisture and photo radiation, such as UV light, and methods for preparing and using same. In particular, the compositions of the present invention contain a polyether or polyester backbone, photocurable portion(s) and moisture curable portion(s). The photo curable portion is a urethane or carbamate linkage terminated with a (meth)acryloxyalkyl group. The moisture curable portion is either: (1) a portion terminated with a polyalkoxysilyl group; or (2) a portion having a urea linkage terminated with an alkylpolyalkoxysilyl group.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZLByKU3MUUguLUpVSM7PLcgvzizJzM8rVkjNLcjJr8zMS1dIK0pNVShKTMlMBipMzEtRCAoJA2vgYWBNS8wpTuWF0twMCm6uIc4euqXFBYklqXklxfHpRYkgysDc0szAxMTUmAglACeEL5U</recordid><startdate>20110614</startdate><enddate>20110614</enddate><creator>Jacobine, Anthony F</creator><creator>Woods, John G</creator><creator>Nakos, Steven T</creator><creator>Lim, Thomas Fay-Oy</creator><scope>EFH</scope></search><sort><creationdate>20110614</creationdate><title>Dual cure compositions employing free radical and RTV cure</title><author>Jacobine, Anthony F ; Woods, John G ; Nakos, Steven T ; Lim, Thomas Fay-Oy</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_079604453</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Jacobine, Anthony F</creatorcontrib><creatorcontrib>Woods, John G</creatorcontrib><creatorcontrib>Nakos, Steven T</creatorcontrib><creatorcontrib>Lim, Thomas Fay-Oy</creatorcontrib><creatorcontrib>Henkel Corporation</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Jacobine, Anthony F</au><au>Woods, John G</au><au>Nakos, Steven T</au><au>Lim, Thomas Fay-Oy</au><aucorp>Henkel Corporation</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Dual cure compositions employing free radical and RTV cure</title><date>2011-06-14</date><risdate>2011</risdate><abstract>The present invention relates to dual curing compositions, which cure with moisture and photo radiation, such as UV light, and methods for preparing and using same. In particular, the compositions of the present invention contain a polyether or polyester backbone, photocurable portion(s) and moisture curable portion(s). The photo curable portion is a urethane or carbamate linkage terminated with a (meth)acryloxyalkyl group. The moisture curable portion is either: (1) a portion terminated with a polyalkoxysilyl group; or (2) a portion having a urea linkage terminated with an alkylpolyalkoxysilyl group.</abstract><oa>free_for_read</oa></addata></record>
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title Dual cure compositions employing free radical and RTV cure
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T15%3A26%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Jacobine,%20Anthony%20F&rft.aucorp=Henkel%20Corporation&rft.date=2011-06-14&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07960445%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true