Process for cleaning a semiconductor wafer using a cleaning solution

Process for cleaning a semiconductor wafer using a cleaning solution

Semiconductor wafers are cleaned using a cleaning solution containing an alkaline ammonium component in an initial composition, wherein the semiconductor wafer is brought into contact with the cleaning solution in an individual-wafer treatment, and in the course of cleaning hydrogen fluoride is adde...

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Hauptverfasser: Zapilko, Clemens, Buschhardt, Thomas, Feijoo, Diego, Schwab, Guenter
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Sprache:eng
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creator Zapilko, Clemens
Buschhardt, Thomas
Feijoo, Diego
Schwab, Guenter
description Semiconductor wafers are cleaned using a cleaning solution containing an alkaline ammonium component in an initial composition, wherein the semiconductor wafer is brought into contact with the cleaning solution in an individual-wafer treatment, and in the course of cleaning hydrogen fluoride is added as further component to the cleaning solution, and the cleaning solution has at the end of cleaning, a composition that differs from the initial composition.
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title Process for cleaning a semiconductor wafer using a cleaning solution
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