Cluster tool architecture for processing a substrate

Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and als...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Ishikawa, Tetsuya, Roberts, Rick J, Armer, Helen R, Volfovski, Leon, Pinson, Jay D, Rice, Michael, Quach, David H, Salek, Mohsen S, Lowrance, Robert, Weaver, William Tyler, Carlson, Charles, Wang, Chongyang, Hudgens, Jeffrey, Herchen, Harald, Lue, Brian, Backer, John A
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!