Metal etch stop fabrication method and structure

A first patterned etch stop layer and a first patterned conductor layer are laminated by a dielectric material to a second patterned etch stop layer and a second patterned conductor layer. As the etch stop metal of the first and second patterned etch stop layers is selectively etchable compared to a...

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Bibliographische Detailangaben
Hauptverfasser: Huemoeller, Ronald Patrick, Rusli, Sukianto, Darveaux, Robert F
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
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