Sputtering target and manufacturing method therefor, and recordable optical recording medium

Sputtering target and manufacturing method therefor, and recordable optical recording medium

To provide a sputtering target for preparing a recordable optical recording medium characterized by comprising Bi and B and a manufacturing method thereof, a recordable high density optical recording medium using the sputtering target, and a sputtering target which is capable of improving a speed of...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Hayashi, Yoshitaka, Sasa, Noboru, Fujii, Toshishige, Fujiwara, Masayuki, Miura, Hiroshi, Kato, Masaki, Kibe, Takeshi, Narumi, Shinya
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:To provide a sputtering target for preparing a recordable optical recording medium characterized by comprising Bi and B and a manufacturing method thereof, a recordable high density optical recording medium using the sputtering target, and a sputtering target which is capable of improving a speed of the film formation for the improvement of productivity, which has a high intensity at the time of the film formation and which has a heightened packing density.