Electron beam apparatus

A plurality of primary beams are formed from a single electron source, the surface charge of a sample is controlled by at least one primary beam, and at the same time, the inspection of the sample is conducted using a primary beam other than this. Also, for an exposure area of the primary beam for s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Tanimoto, Sayaka, Ohta, Hiroya, Makino, Hiroshi, Funatsu, Ryuichi
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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