Plasma deposition apparatus and method for making polycrystalline silicon

A plasma deposition apparatus for making polycrystalline silicon including a chamber for depositing said polycrystalline silicon, the chamber having an exhaust system for recovering un-deposited gases; a support located within the deposition chamber for holding a target substrate having a deposition...

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Bibliographische Detailangaben

Hauptverfasser:	Aslami, Mohd A, Wu, Dau, Charles, DeLuca
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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