Immersion lithography contamination gettering layer

A method of forming an image in a photoresist layer. The method includes, providing a substrate; forming the photoresist layer over the substrate; forming a contamination gettering topcoat layer over the photoresist layer, the contamination gettering topcoat layer including one or more polymers and...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Corliss, Daniel A, Gil, Dario, Goldfarb, Dario Leonardo, Holmes, Steven John, Horak, David Vaclav, Kimmel, Kurt Rudolf, Petrillo, Karen Elizabeth, Shneyder, Dmitriy
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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