Deposition-selective etch-deposition process for dielectric film gapfill

A deposition/etching/deposition process is provided for filling a gap in a surface of a substrate. A liner is formed over the substrate so that distinctive reaction products are formed when it is exposed to a chemical etchant. The detection of such reaction products thus indicates that the portion o...

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Hauptverfasser:	Zhang, Lin, Chen, Xiaolin, Li, DongQing, Pham, Thanh N, Moghadam, Farhad K, Li, Zhuang, Krishnaraj, Padmanabhan
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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