Projection lens system of a microlithographic projection exposure installation

Projection lens system of a microlithographic projection exposure installation

A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable fo...

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Hauptverfasser: Beierl, Helmut, Bleidistel, Sascha, Singer, Wolfgang, Gruner, Toralf, Epple, Alexander, Wabra, Norbert, Beder, Susanne, Weber, Jochen, Feldmann, Heiko, Schwaer, Baerbel, Rogalsky, Olaf, Kazi, Ari
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creator Beierl, Helmut
Bleidistel, Sascha
Singer, Wolfgang
Gruner, Toralf
Epple, Alexander
Wabra, Norbert
Beder, Susanne
Weber, Jochen
Feldmann, Heiko
Schwaer, Baerbel
Rogalsky, Olaf
Kazi, Ari
description A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
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title Projection lens system of a microlithographic projection exposure installation
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